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Self-assembly on copper surface by using imidazole derivative for corrosion protection

机译:铜表面上的自组装通过使用咪唑衍生物进行腐蚀保护

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摘要

This paper presents the self-assembly of 1-(3-aminopropyl) imidazole (API) monolayer on the copper surface to study the inhibition effect of the API against copper corrosion in 3% NaCl solution. The optimum concentration and assembling time for the assembly of API on copper were ascertained using electrochemical impedance spectroscopy (EIS). It was found that the API self-assembled monolayer (SAM) was formed with the concentration of 1.0mM of API at 24h assembling time and the maximum inhibition efficiency that could be achieved was 93.10%. The API SAM on copper was characterized by Fourier transform infrared spectroscopy (FT-IR), energy dispersive X-ray analysis (EDX), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and water contact angle measurement (WCA). The presence of N and C signals in the XPS and EDX, show that the API molecules successfully anchor on the copper surface which demonstrates formation of API SAM on the copper surface. Corrosion protection capability of the copper modified with API was evaluated by the electrochemical polarization study (EPS) and scanning electron microscopy (SEM). The results of electrochemical and SEM analysis revealed that the API modified copper showed better corrosion protection in 3% NaCl solution.
机译:本文介绍了铜表面上的1-(3-氨基丙基)咪唑(API)单层的自组装,研究API对3%NaCl溶液中铜腐蚀的抑制作用。使用电化学阻抗光谱(EIS)确定API上API组装的最佳浓度和组装时间。发现API自组装单层(SAM)在24h组装时间下以1.0mm API的浓度形成,并且可以实现的最大抑制效率为93.10%。铜上的API SAM以傅里叶变换红外光谱(FT-IR),能量分散X射线分析(EDX),X射线光电子能谱(XPS),原子力显微镜(AFM)和水接触角测量(WCA)(WCA) )。在XPS和EDX中存在N和C信号,表明API分子成功地锚固在铜表面上,该铜表面上表现出铜表面上的API SAM的形成。通过电化学偏振研究(EPS)和扫描电子显微镜(SEM)评估用API改性铜的腐蚀保护能力。电化学和SEM分析结果表明,API改性铜在3%NaCl溶液中显示出更好的腐蚀保护。

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