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Optical centers and their depth distribution in electron irradiated CVD diamond

机译:电子照射CVD金刚石中的光学中心及其深度分布

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Detailed measurements of photoluminescence of commercial CVD diamond irradiated with 1 MeV commercial electron accelerator have been performed. It has been assumed that the depth distribution of radiation-induced defects can be described by contributions of two mechanisms: strong defect production by primary fast electrons and weak secondary irradiation by gamma rays. Thickness of the layer of the strong defect production has been found of 0.7 mm what is about half the theoretically predicted propagation depth of 1 MeV electrons in diamond (1.2 mm). The secondary gamma irradiation penetrates through the whole diamond sample (3.4mm in the present case). Spectral features of several optical centers formed in as-irradiated CVD diamond and after subsequent annealing at moderate and high temperatures have been discussed. Some of these centers have been ascribed to modified 3H defects. A center with zero-phonon line (ZPL) at 733.2 nm has been ascribed to an intrinsic split-vacancy defect. The radiation-stimulated aggregation of nitrogen has been observed as the formation of H3 defects. It has been shown that the merging of NV defects into H3 defects is not a major pathway of the nitrogen aggregation. It has been confirmed that the temperature stability of NV defects in undamaged diamond lattice exceeds 2000 degrees C. Destruction of NV centers, frequently seen at temperatures below 2000 degrees C, is the result of interaction of NV defects with other mobile defects. Recently discovered centers with broad ZPLs at 462.5 and 498.8 nm, which are characteristic of CVD diamond, have been found to be very radiation and temperature stable and immune against any known treatment of diamond. It has been proposed to use detection of these centers as a method of recognition of CVD diamonds. (C) 2016 Elsevier B.V. All rights reserved.
机译:已经进行了用1MEV商业电子加速器照射的商业CVD金刚石的光致发光的详细测量。已经假设辐射诱导的缺陷的深度分布可以通过两种机制的贡献来描述:通过初级快速电子和γ射线弱的次级照射产生强烈的缺陷。强缺损生产层的厚度已被发现为0.7mm,其中大约一半的金刚石(1.2mm)中的1meV电子的一半大约一半。次级伽马照射穿过整个金刚石样品(在当前情况下3.4mm)。已经讨论了在适度和高温下在适度和高温下进行后续退火后形成的几种光学中心的光谱特征。其中一些中心已经归因于修改了3H缺陷。 733.2nm的零位线(zpl)的中心已归因于内在的分裂空位缺陷。已经观察到氮的辐射刺激的聚集作为H3缺陷的形成。已经表明,NV缺陷与H3缺陷的合并不是氮聚集的主要途径。已经证实,未损坏的金刚石晶格中NV缺陷的温度稳定性超过2000摄氏度。在2000℃以下的温度下经常看到NV中心的破坏是NV缺陷与其他移动缺陷的相互作用的结果。最近发现具有462.5和498.8nm的宽Zpls的中心,该中心是CVD金刚石的特征,已被发现是非常辐射和温度稳定,免受任何已知的金刚石处理的免疫。已经提出使用这些中心的检测作为识别CVD钻石的方法。 (c)2016年Elsevier B.v.保留所有权利。

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