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首页> 外文期刊>Transactions of the Indian Institute of Metals >Fabrication and Characterization of Cu-B4C Metal Matrix Composite by Powder Metallurgy: Effect of B4C on Microstructure, Mechanical Properties and Electrical Conductivity
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Fabrication and Characterization of Cu-B4C Metal Matrix Composite by Powder Metallurgy: Effect of B4C on Microstructure, Mechanical Properties and Electrical Conductivity

机译:粉末冶金Cu-B4C金属基质复合材料的制备与表征:B4C对微观结构,机械性能和电导率的影响

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Boron carbide-reinforced copper metal matrix composites have been the subject of broad research because of their good mechanical, electrical and tribological properties. In the present research, Cu-B4C composites containing 5, 10 and 15wt% of B4C have been fabricated by cold powder compaction followed by conventional sintering at 900 degrees C for 1h under argon atmosphere. The fabricated composites are characterized by X-ray diffraction, optical microscopy and field emission scanning electron microscopy (FESEM). From microscopic study, we have found that B4C particles are homogeneously distributed in the copper matrix and there is good compatibility between B4C and Cu. The microstructure analyzed by FESEM shows that the interface between Cu matrix and B4C is clean and no interfacial product is formed. The effect of B4C particles and their weight fraction on microstructure, mechanical properties and electrical conductivity is also studied. The Vickers hardness value increases with increasing weight percentage of boron carbide in Cu matrix. The hardness value increases from 38 VHN for pure copper to 79 VHN for Cu-15wt% B4C metal matrix composite (MMC). A maximum relative density of 82% is achieved for Cu-5wt% B4C MMC. The maximum compressive strength of 315MPa is achieved for Cu-15wt% B4C MMC. The electrical conductivity of pure Cu is found to be 4.5x10(6)S/m, and it decreases to 1.92x10(6), 0.75x10(6) and 0.32x10(6)S/m for Cu-5wt% B4C, Cu-10wt% B4C and Cu-15wt% B4C MMCs, respectively.
机译:碳化硼增强铜金属基复合材料是由于其良好的机械,电气和摩擦学特性,是广泛研究的主题。在本研究中,含有5,10和15wt%B4C的Cu-B4C复合材料通过冷粉末压实,然后在氩气氛下在900℃下常规烧结1H。制造的复合材料的特征在于X射线衍射,光学显微镜和场发射扫描电子显微镜(FESEM)。从微观研究中发现,B4C颗粒在铜基质中均匀地分布,B4C和Cu之间存在良好的相容性。通过FeSEM分析的微观结构表明Cu基质和B4C之间的界面是清洁的,没有形成界面产品。还研究了B4C颗粒的作用及其重量分数对微观结构,机械性能和导电性的影响。随着Cu基质中碳化硼的重量百分比增加,维氏硬度值增加。对于Cu-15wt%B4C金属基质复合材料(MMC),硬度值从38 VH增加到79 VHN的79 VH。对于Cu-5wt%B4C MMC,实现了82%的最大相对密度。对于Cu-15wt%B4C MMC,实现了315MPa的最大抗压强度。纯Cu的电导率被发现为4.5×10(6)S / m,并且对于Cu-5wt%B4C,它降至1.92×10(6),0.75x10(6)和0.32×10(6)S / M, Cu-10wt%b4c和Cu-15wt%b4cmms。

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