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首页> 外文期刊>Plasma Sources Science & Technology >The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas
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The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single- and dual-frequency capacitively coupled plasmas

机译:实际重粒子诱导的二次电子发射系数对单频电容耦合等离子体中电子功率吸收动力学的影响

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摘要

In particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations of capacitively coupled plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in which a constant secondary electron emission coefficient (SEEC) is assumed for ions bombarding the electrodes. In most PIC/MCC studies of CCPs, this coefficient is set to γ = 0.1, independent of the energy of the incident particle, the electrode material, and the surface conditions. Here, the effects of implementing energy-dependent secondary electron yields for ions, fast neutrals, and taking surface conditions into account in PIC/MCC simulations is investigated. Simulations are performed using self-consistently calculated effective SEECs, g*, for ‘clean' (e.g., heavily sputtered) and ‘dirty' (e.g., oxidized) metal surfaces in single- and dualfrequency discharges in argon and the results are compared to those obtained by assuming a constant secondary electron yield of g = 0.1 for ions. In single-frequency (13.56 MHz) discharges operated under conditions of low heavy particle energies at the electrodes, the pressure and voltage at which the transition between the α- and γ-mode electron power absorption occurs are found to strongly depend on the surface conditions. For ‘dirty' surfaces, the discharge operates in α-mode for all conditions investigated due to a low effective SEEC. In classical dual-frequency (1.937MHz + 27.12MHz) discharges g* significantly increases with increasing low-frequency voltage amplitude, VLF, for dirty surfaces. This is due to the effect of VLF on the heavy particle energies at the electrodes, which negatively influences the quality of the separate control of ion properties at the electrodes. The new results on the separate control of ion properties in such discharges indicate significant differences compared to previous results obtained with different constant values of γ.
机译:在电容耦合等离子体(CCPS)的粒子内/蒙特卡罗碰撞(PIC / MCC)模拟中,等离子体表面相互作用通常通过一个简单的模型来描述,其中假设恒定的二次电子发射系数(SEEC)离子轰击电极。在CCP的大多数PIC / MCC研究中,该系数被设定为γ= 0.1,与入射粒子,电极材料和表面条件无关。这里,研究了在PIC / MCC模拟中实施离子,快节育率和表面条件的能量依赖性二次电子产率的影响。使用自始于计算的有效SEECS,G *,用于“清洁”(例如,严重溅射)和“脏”(例如,氧化的)金属表面,在氩气中的单一和二元排放中的“脏”(例如,氧化)金属表面进行仿真,结果与那些相比通过假设离子的恒定的二次电子产率G = 0.1来获得。在单频(13.56MHz)的放电,在电极的低重粒子能量的条件下操作,发现α-和γ模电子功率吸收之间的过渡发生的压力和电压强烈取决于表面条件。对于“脏”表面,放电以α-Mode运行,因为由于低效的SEEC而调查的所有条件。在经典的双频率(1.937MHz + 27.12MHz)中,G *显着增加随着低频电压幅度VLF用于脏表面而显着增加。这是由于VLF对电极的重质粒子能量的影响,这对电极处的离子特性的单独控制的质量负负面影响。与以不同恒定值的γ获得的先前结果相比,在这种放电中单独控制的新结果表明与先前的结果相比表明了显着的差异。

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  • 作者单位

    Department of Physics West Virginia University Morgantown WV 26506 United States of America;

    Department of Physics West Virginia University Morgantown WV 26506 United States of America;

    Institute of Theoretical Electrical Engineering Ruhr-University Bochum D-44780 Bochum Germany;

    Institute of Theoretical Electrical Engineering Ruhr-University Bochum D-44780 Bochum Germany;

    Brandenburg University of Technology Cottbus-Senftenberg Siemens-Halske-Ring 14 D-03046 Cottbus Germany;

    Institute of Electrical Engineering and Plasma Technology Ruhr-University Bochum D-44780 Bochum Germany;

    Institute for Solid State Physics and Optics Wigner Research Centre for Physics Hungarian Academy of Sciences 1121 Budapest Konkoly Thege Miklós str. 29-33 Hungary;

    Department of Physics West Virginia University Morgantown WV 26506 United States of America;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 等离子体物理学;
  • 关键词

    capacitively coupled plasmas; plasma-surface interaction; secondary electron emission;

    机译:电容耦合等离子体;等离子体表面相互作用;二次电子发射;

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