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首页> 外文期刊>Small >Threshold Voltage Control of Multilayered MoS_2 Field- Effect Transistors via Octadecyltrichlorosilane and their Applications to Active Matrixed Quantum Dot Displays Driven by Enhancement-Mode Logic Gates
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Threshold Voltage Control of Multilayered MoS_2 Field- Effect Transistors via Octadecyltrichlorosilane and their Applications to Active Matrixed Quantum Dot Displays Driven by Enhancement-Mode Logic Gates

机译:多层MOS_2场效应晶体管的阈值电压控制通过十八烷基三氯硅烷及其应用于由增强模式逻辑门驱动的有源矩阵量子点显示的应用

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摘要

In recent past, for next-generation device opportunities such as sub-10 nm channel field-effect transistors (FETs), tunneling FETs, and high-end display backplanes, tremendous research on multilayered molybdenum disulfide (MoS_2) among transition metal dichalcogenides has been actively performed. However, nonavailability on a matured threshold voltage control scheme, like a substitutional doping in Si technology, has been plagued for the prosperity of 2D materials in electronics. Herein, an adjustment scheme for threshold voltage of MoS_2 FETs by using self-assembled monolayer treatment via octadecyltrichlorosilane is proposed and demonstrated to show MoS_2 FETs in an enhancement mode with preservation of electrical parameters such as field-effect mobility, subthreshold swing, and current on-off ratio. Furthermore, the mechanisms for threshold voltage adjustment are systematically studied by using atomic force microscopy, Raman, temperature- dependent electrical characterization, etc. For validation of effects of threshold voltage engineering on MoS_2 FETs, full swing inverters, comprising enhancement mode drivers and depletion mode loads are perfectly demonstrated with a maximum gain of 18.2 and a noise margin of ≈45% of 1/2 VDD. More impressively, quantum dot light-emitting diodes, driven by enhancement mode MoS_2 FETs, stably demonstrate 120 cd m~(-2) at the gateto- source voltage of 5 V, exhibiting promising opportunities for future display application.
机译:最近,对于下一代设备机会,例如Sub-10 NM信道场效应晶体管(FET),隧道FET和高端显示背板,在过渡金属二甲基化物中的多层钼二硫化物(MOS_2)的巨大研究积极地进行。然而,在Si技术的替代阈值控制方案上的不可用性,如SI技术的替代兴奋剂,已经困扰了电子产品中的2D材料的繁荣。在此,提出了通过使用十八烷基三氯硅烷使用自组装单层处理的MOS_2 FET的阈值电压的调整方案,并证明了在增强模式中显示MOS_2 FET,其保存电气参数,例如场效应迁移率,亚阈值摆动和电流-off比率。此外,通过使用原子力显微镜,拉曼,温度依赖的电学表征等系统地研究了用于阈值电压调节的机制,用于验证阈值电压工程在MOS_2 FET上的效果,全挥杆逆变器,包括增强模式驱动器和耗尽模式载荷完全展示,最大增益为18.2,噪声裕度为1/2 VDD的噪声裕度。更令人印象深刻地,由增强模式MOS_2 FET驱动的量子点发光二极管,在5V的Gateto源电压下稳定地示出了120cd m〜(-2),对未来的显示应用展示了有希望的机会。

著录项

  • 来源
    《Small》 |2019年第7期|共10页
  • 作者单位

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Electronic Engineering Incheon National University Academy-ro Yeongsu-gu Incheon 22012 Republic of Korea;

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Electronic Engineering Incheon National University Academy-ro Yeongsu-gu Incheon 22012 Republic of Korea;

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea;

    Department of Chemical and Biomolecular Engineering Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea;

    Department of Chemistry Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    SKKU Advanced Institute of Nano Technology (SAINT) Sungkyunkwan University Seobu-ro Jangan-gu Suwon-si 16419 Gyeonggi-do Republic of Korea;

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Electrical and Computer Engineering Inter-University Semiconductor Research Center Seoul National University 1 Gwanak-ro Gwanak-gu Seoul 08826 Republic of Korea;

    Department of Electronic Engineering Incheon National University Academy-ro Yeongsu-gu Incheon 22012 Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    field-effect transistors; logic gate; MoS_2; quantum-dot light-emitting diode; threshold voltage control;

    机译:场效应晶体管;逻辑门;MOS_2;量子点发光二极管;阈值电压控制;

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