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Photon-number resolving capability in SiPMs with electric field variation for radiation detection applications

机译:具有电场变化的辐射检测应用的SIPMS中的光子数分辨能力

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摘要

In this paper, we investigate how the SiPM characteristics might vary in different electric field conditions in terms of parameters such as dark count rate and photon detection efficiency and present their relationships via SiPM photon-number-resolution (R-SiPM). The device samples were fabricated on 200 mm epitaxial wafers with a sensor area of 2.95 x 2.95 mm(2) and a micro-cell size of 65 m. Keeping all other fabrication conditions identical, four different p-well implantation conditions were selected to produce four different electric field profiles: 5.0 x 10(12), 4.0 x 10(12), 3.0 x 10(12), and 2.5 x 10(12) atoms/cm(2). From the fabricated samples, measurements on the breakdown voltage, dark count rate, and photon detection efficiency were obtained accordingly. Based on the measured device parameters, R-SiPM of each sample was calculated to demonstrate how the electric field in the depletion region could influence the device performance. The intention of this study is to provide a guideline for obtaining the optimal SiPM parameters for target applications under a given fabrication condition.
机译:在本文中,我们研究了在诸如暗计数率和光子检测效率的参数方面的不同电场条件中的SIPM特性如何变化,并通过SIPM光子号分辨率(R-SIPM)呈现它们的关系。将器件样品在200mm外延晶片上制造,传感器面积为2.95×2.95mm(2)和65米的微细胞尺寸。保持所有其他制造条件相同,选择四种不同的P良好的植入条件以产生四种不同的电场型材:5.0×10(12),4.0×10(12),3.0×10(12)和2.5×10( 12)原子/ cm(2)。从制造的样品,相应地获得了对击穿电压,暗计数率和光子检测效率的测量。基于测量的装置参数,计算每个样品的R-SIPM以证明耗尽区域中的电场如何影响器件性能。本研究的目的是提供在给定制造条件下获得目标应用的最佳SIPM参数的指导。

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