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首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >The optimization of electrospray process based on auxiliary electrode
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The optimization of electrospray process based on auxiliary electrode

机译:基于辅助电极的电喷雾过程的优化

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In order to control the charged jet and deposition area of the glass frit in the electrostatic spray system, the nozzles with/without sleeve-type auxiliary electrode are comparatively studied through simulations and experiments. The influence of the voltage applied on the auxiliary electrode and its diameter is analyzed. According to the vector diagram and the distribution of electric field intensity, the optimal values for the applied voltage and the diameter of the auxiliary electrode are determined for the present work, i.e. 1.5 kV and 6 mm, respectively. The experimental results further demonstrate the nozzle with the auxiliary electrode is much better than the one without the electrode, and under the above optimized condition the charged jet can be well controlled to deposit glass frit film on silicon wafer with a line width of 330 mu m, which is much more narrow than the conventional nozzle (without the electrode). This work will offer another good way for better control of the deposition during electrostatic spray process.
机译:为了控制静电喷雾系统中的玻璃料的带电射流和沉积面积,通过模拟和实验相比,具有/不具有套筒型辅助电极的喷嘴。分析施加在辅助电极上的电压及其直径的影响。根据矢量图和电场强度的分布,针对当前工作,即1.5kV和6mm,确定施加电压和辅助电极直径的最佳值。实验结果进一步证明了具有辅助电极的喷嘴远优于没有电极的电极,并且在上述优化状态下,可以很好地控制带电射流,以沉积在硅晶片上的玻璃玻璃料,线宽为330μm ,这比传统喷嘴(没有电极)更窄。这项工作将提供另一种良好的方法,可以更好地控制静电喷涂过程中的沉积。

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