...
首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Effect of temperature on polyimide dc flashover characteristics in different vacuum degrees
【24h】

Effect of temperature on polyimide dc flashover characteristics in different vacuum degrees

机译:温度对不同真空度的聚酰亚胺直流闪络特性的影响

获取原文
获取原文并翻译 | 示例
           

摘要

The properties of electrical insulation in vacuum and at cryogenic temperatures are important for designing the insulation of large, low-temperature superconducting devices. Particularly, gas pressure and temperature turbulence could easily lead to insulation failure. In this paper, the results of measurements that reveal the dc flashover characteristics of polyimide film from 300 to 20K at helium pressures of 10(-3)-10(3) Pa were reported. The results show that, in high vacuum, the flashover voltage is generally independent of pressure. As pressure increases, the flashover voltage first decreases and then increases gradually. Electron multiplication in helium or on the surface of PI is the main factor affecting flashover. For high to medium vacuum, the N (gas molecular density) at which electrons begin to collide with helium and reduce flashover voltage at higher temperature is less than at cryogenic temperatures. For medium to low vacuum, by comparing the flashover curve with a curve fit based on Townsend discharge theory, a result was found that when a certain specific N is exceeded, the electron impact ionization on the solid surface will no longer be the main influencing factor of flashover. This N increases as temperature decreases except 200K, and reaches the minimum at 200K. After analysis, it may be the larger mean free path of electrons increases the likelihood of electron impact ionization on the PI surface. Therefore, in order to maintain a high flashover voltage in engineering, it is necessary to maintain a higher degree of vacuum at higher temperatures; and when the pressure rises to low vacuum, the flashover is mainly determined by the gas discharge.
机译:真空和低温温度下电绝缘性的性能对于设计大型低温超导装置的绝缘性很重要。特别地,气体压力和温度湍流很容易导致绝缘失效。本文报道了在10(-3)-10(3)PA的氦气压力下,揭示从300至20k的聚酰亚胺膜的DC闪络特性的测量结果。结果表明,在高真空中,闪络电压通常与压力无关。随着压力的增加,闪络电压首先降低,然后逐渐增加。氦气或PI表面上的电子乘法是影响闪络的主要因素。对于高于中等真空,电子开始与氦气碰撞并在较高温度下减少闪络电压的N(气体分子密度)小于低温温度。对于培养基为低真空,通过基于汤德放电理论将闪络曲线与曲线配合进行比较,发现当超过某一特异性N时,固体表面上的电子冲击电离将不再是主要影响因子闪络。随着温度降低,除200k之外的温度降低,该n增加,并达到200k的最小值。在分析之后,它可以是较大的扁平自由路径增加了电子冲击电离在PI表面上的可能性。因此,为了保持工程中的高闪络电压,有必要在较高温度下保持更高的真空度;并且当压力升高到低真空时,闪络主要由气体放电决定。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号