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机译:Beta-Taon薄膜:通过反应磁控溅射的生产和非化学计量的问题
Rudjer Boskovic Inst Bijenicka Cesta 54 HR-10000 Zagreb Croatia;
Rudjer Boskovic Inst Bijenicka Cesta 54 HR-10000 Zagreb Croatia;
Rudjer Boskovic Inst Bijenicka Cesta 54 HR-10000 Zagreb Croatia;
Rudjer Boskovic Inst Bijenicka Cesta 54 HR-10000 Zagreb Croatia;
Rudjer Boskovic Inst Bijenicka Cesta 54 HR-10000 Zagreb Croatia;
Univ Rijeka Dept Phys R Matejcic 2 Rijeka 51000 Croatia;
Univ Rijeka Dept Phys R Matejcic 2 Rijeka 51000 Croatia;
Elettra Sincrotrone Trieste Str Statale 14 Km 163-5 AREA Sci Pk I-34149 Basovizza Trieste Italy;
Tantalum oxynitride; reactive magnetron deposition; growth; structure; composition; stoichiometry;
机译:Beta-Taon薄膜:通过反应磁控溅射的生产和非化学计量的问题
机译:反应溅射制备NaCl型CrN薄膜的非化学计量和反铁磁相变
机译:反应溅射制备NaCl型CrN薄膜的非化学计量和反铁磁相变
机译:通过反应直流磁控溅射和高功率脉冲磁控溅射在SiO_2上生长的锡薄膜的比较
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:反应磁控溅射沉积TiO2薄膜的光催化性能的途径
机译:高功率脉冲磁控溅射和直流磁控溅射反应溅射ZrH2薄膜