首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Synthesis of restacking-free wrinkled Ti3C2Tx monolayers by sulfonic acid group grafting and N-doped carbon decoration for enhanced supercapacitor performance
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Synthesis of restacking-free wrinkled Ti3C2Tx monolayers by sulfonic acid group grafting and N-doped carbon decoration for enhanced supercapacitor performance

机译:通过磺酸组嫁接和N掺杂碳装饰的完全自堆皱纹Ti3C2Tx单层的合成,提高超级电容器性能

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摘要

Although Ti3C2Tx MXene is emerging as a new two-dimensional energy storage material with excellent physical and chemical properties, its surface termination and easy restacking have severely limited such a promising application. Herein, we reported a new modification strategy for Ti3C2Tx by grafting with sulfonic acid group and decoration with N-doped carbon (abbreviated as S-Ti3C2Tx@N-C), after which the interlayer spacing of the wrinkled Ti3C2Tx was effectively expanded with additive active sites, and the electrochemical performance was enhanced apparently. Based on a standard three-electrode system, the specific capacitance of S-Ti3C2Tx@N-C-700 degrees C (annealed at 700 degrees C) electrode was elevated to a high value as 260 F g(-1) at a current density of 0.8 A g(-1), about 3 times that of Ti3C2Tx, also higher than that of many other Ti3C2Tx-based materials in literature. Moreover, the S-Ti3C2Tx@N-C-700 degrees C electrode maintains 90% of the initial capacitance after 5000 cycles. This work provides a simple and efficient approach of the electrode modification suitable for further energy applications. (C) 2020 Elsevier B.V. All rights reserved.
机译:尽管Ti3C2TX MXENE作为一种具有优异的物理和化学性质的新型二维能量储存材料,但其表面终端和易于重新包装严重限制了如此有希望的应用。在此,我们通过用N-掺杂的碳包接枝(缩写为S-Ti3C2Tx @ NC),报告了Ti3C2Tx的新改性策略,之后用添加活性位点有效地扩增皱纹Ti3C2Tx的层间间隔,并且显然可以增强电化学性能。基于标准的三电极系统,S-Ti3C2TX @ NC-700度(在700℃下退火)电极的比电容在电流密度为0.8的电流密度下升高到高值为260 f g(-1) G(-1),Ti3C2TX的约3倍,也高于许多其他基于Ti3C2TX的文献中的材料。此外,S-TI3C2TX @ N-C-700摄氏度C电极在5000次循环后保持90%的初始电容。这项工作提供了一种适用于进一步的能量应用的电极改性的简单有效的方法。 (c)2020 Elsevier B.v.保留所有权利。

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