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首页> 外文期刊>Physical chemistry chemical physics: PCCP >A computational study of hydrogen doping induced metal-to-insulator transition in CaFeO3, SrFeO3, BaFeO3 and SmMnO3
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A computational study of hydrogen doping induced metal-to-insulator transition in CaFeO3, SrFeO3, BaFeO3 and SmMnO3

机译:Cafeo3,SrfeO3,Bafeo3和Smmno3中氢掺杂赋予金属对绝缘体过渡的计算研究

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The metal-to-insulator transition (MIT) in rare earth perovskite oxides has drawn significant research interest for decades to unveil the underlying physics and develop novel electronic materials. Recently, chemical doping induced MIT in SmNiO3 has been observed experimentally, with its resistivity changed by eight orders of magnitude. The mechanism of switching from one singly occupied Ni e(g) orbital to two singly occupied e(g) orbitals upon doping has been proposed by experimentalists and verified by computation. Here, we tested if this mechanism can be generally applied to other perovskite oxides with non-Ni B site elements. We applied first principles density functional theory (DFT) to study a series of perovskite oxides, CaFeO3, SrFeO3, BaFeO3 and SmMnO3. We investigated the geometry and electronic structures of pure and hydrogen doped oxides. We found that pure CaFeO3, SrFeO3 and BaFeO3 are metallic while pure SmMnO3 has a small band gap of 0.69 eV. Upon hydrogen doping, band gap opening was predicted for all four oxides: HSE06 predicted band gap values of 1.58 eV, 1.40 eV, 1.20 eV and 2.55 eV for H-doped CaFeO3, SrFeO3, BaFeO3 and SmMnO3, respectively. This finding opens up research opportunities for exploring a broader range of materials for MIT to be used in optical and electronic devices.
机译:稀土钙钛矿氧化物中的金属到绝缘体过渡(麻省理工学院)对几十年来说,揭示了底层物理和开发新型电子材料的显着研究兴趣。最近,实验地观察了SMNIO3中的化学掺杂诱导的MIT,其电阻率变为八个数量级。通过实验主义者提出了从单独占用的Ni E(g)轨道转换为两个单独占用的e(g)轨道的机制,并通过计算验证。在这里,我们测试了这种机制通常可以用非Ni B位点元素应用于其他钙钛矿氧化物。我们应用了第一个原理密度泛函理论(DFT)研究一系列钙钛矿氧化物,CaFeO3,SRFeO3,Bafebo3和SmmnO3。我们调查了纯和掺杂氧化物的几何形状和电子结构。我们发现纯Cafeo3,SRFeO3和Bafebo3是金属的,而纯SMMNO3的小带隙为0.69eV。在氢气掺杂时,为所有四种氧化物预测带间隙开口:HSE06预测带隙值为1.58eV,1.40eV,1.20eV和2.55eV分别用于H掺杂的CaFeo3,SRFeO3,Bafebo3和SMMNO3。这一发现开辟了探索更广泛的材料的研究机会,以便在光学和电子设备中使用。

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