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A plasma strategy for high-quality Si/C composite anode: From tailoring the current collector to preparing the active materials

机译:高质量Si / C复合阳极的等离子体策略:从剪裁集电器到制备活性材料

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Herein we propose a novel plasma-based route to synergistically modulate the microstructures of the current collectors of nickel foam and subsequently the Si/C composite active coatings, restraining the huge volume expansion of silicon anode materials during lithiation/delithiation in Lithium ion batteries. The nickel foam surface is tailored to form the temperature-dependent nanostructures by the Ar/H-2-plasma. And a 3D Si/C nano-composite structure is constructed in combination of silicon via magnetron sputtering and carbon through the inductively coupled plasma vapor deposition (ICP-CVD). The plasma-activated nickel foam surface leads to the crystallization of the sputtered silicon, and the significantly increased surface area results in the increases of loading rate of Si/C composites (e.g., 75% @room temperature). The electrochemical performance, e.g., the specific capacity, cycle stability and the initial Coulombic efficiency of the composite anode is drastically improved by the plasma processing. The cauliflower-like Si/C composites on the Ar/H-2-plasma modified nickel foam at 300 degrees C exhibits a high capacity of 1941.2 mA h g(-1) at 0.1 A g(-1) after 100 cycles, and 976 mA h g(-1) at 1.6 A g(-1) after 500 cycles, increasing by 3-7 times in terms of the current density when compared with the case without the plasma processing. (C) 2020 Elsevier Ltd. All rights reserved.
机译:在此提出一种新的基于等离子体的途径,以协同调节镍泡沫的集电器的微观结构,然后是Si / C复合活性涂层,限制锂离子电池锂锂电池硅阳极材料的巨大膨胀。镍泡沫表面被定制以通过Ar / H-2 - 血浆形成温度依赖性纳米结构。通过磁控溅射和通过电感耦合等离子体气相沉积(ICP-CVD)的磁共振和碳组合构造3D Si / C纳米复合结构。等离子体活化的镍泡沫表面导致溅射硅的结晶,并且显着增加的表面积导致Si / C复合材料的加载速率增加(例如,75%@Hosh温度)。通过等离子体处理大大提高了电化学性能,例如复合阳极的特定容量,循环稳定性和初始库仑效率。在300摄氏度下的Ar / H-2-血浆改性镍泡沫上的花椰菜样Si / C复合材料在100次循环后的0.1Ag(-1)的高容量为1941.2mA hg(-1),976在500次循环后,MA Hg(-1)在1.6Ag(-1),与电流密度相比,在没有等离子体处理的情况下,在电流密度的方面增加3-7倍。 (c)2020 elestvier有限公司保留所有权利。

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