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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Band-gap engineering of the h-BN/MoS2/h-BN sandwich heterostructure under an external electric field
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Band-gap engineering of the h-BN/MoS2/h-BN sandwich heterostructure under an external electric field

机译:外电场作用下h-BN / MoS2 / h-BN夹层异质结构的带隙工程

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摘要

Based on first-principles calculations in the framework of van der Waals density functional theory, we investigate the structural, electronic properties and band-gap tuning of the h-BN/MoS2/h-BN sandwich heterostructure under an external electric field. We find that, different from the suspended monolayer MoS2 with a direct band-gap, h-BN/MoS2/h-BN has an indirect band-gap. Particular attention has been focused on the engineering of the band-gap of the h-BN/MoS2/h-BN heterostructure via application of an external electric field. With the increase of electric field, the band-gap of the h-BN/MoS2/h-BN heterostructure undergoes an indirect-to-direct band-gap transition. Once the electric field intensity is larger than 0.1 V angstrom(-1), the gap value of direct band-gap shrinks almost linearly with the field-strength, which indicates that the h-BN/MoS2/h-BN heterostructure is a viable candidate for optoelectronic applications.
机译:基于范德华力密度泛函理论框架中的第一性原理计算,我们研究了在外部电场下h-BN / MoS2 / h-BN夹心异质结构的结构,电子性质和带隙调整。我们发现,与具有直接带隙的悬浮单层MoS2不同,h-BN / MoS2 / h-BN具有间接带隙。通过施加外部电场,对h-BN / MoS2 / h-BN异质结构的带隙进行了工程设计。随着电场的增加,h-BN / MoS2 / h-BN异质结构的带隙经历了间接到直接的带隙跃迁。一旦电场强度大于0.1 V埃(-1),则直接带隙的间隙值几乎随场强线性减小,这表明h-BN / MoS2 / h-BN异质结构是可行的光电应用的候选人。

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