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首页> 外文期刊>Journal of chromatography, A: Including electrophoresis and other separation methods >Impact of the limitations of state-of-the-art micro-fabrication processes on the performance of pillar array columns for liquid chromatography
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Impact of the limitations of state-of-the-art micro-fabrication processes on the performance of pillar array columns for liquid chromatography

机译:最新的微细加工工艺的局限性对液相色谱柱阵列色谱柱性能的影响

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We report on the practical limitations of the current state-of-the-art in micro-fabrication technology to produce the small pillar sizes that are needed to obtain high efficiency pillar array columns. For this purpose, nine channels with a different pillar diameter, ranging from 5 to 0.5μm were fabricated using state-of the-art deep-UV lithography and deep reactive ion etching (DRIE) etching technology. The obtained results strongly deviated from the theoretically expected trend, wherein the minimal plate height (H _(min)) would reduce linearly with the pillar diameter. The minimal plate height decreases from 1.7 to 1.2μm when going from 4.80 to 3.81μm diameter pillars, but as the dimensions are further reduced, the minimal plate heights rise again to values around 2μm. The smallest pillar diameter even produced the worst minimal plate height (4μm). An in-depth scanning electron microscopy (SEM) inspection of the different channels clearly reveals that these findings can be attributed to the micro-fabrication limitations that are inevitably encountered when exploring the limits of deep-UV lithography and DRIE etching processes. When the target dimensions of the design approach the etching resolution limits, the band broadening increases in a strongly non-linear way with the decreased pillar dimensions. This highly non-linear relationship can be understood from first principles: when the machining error is of the order of 100-200nm and when the target design size for the inter-pillar distance is of the order of 250nm, this inevitably leads to pores that will range in size between 50 and 450nm that we want to highlight with our paper highly non-linear relationship. This highly non-linear relationship can be understood from first principles: when the machining error is of the order of 100-200nm and when the target design size for the inter-pillar distance is of the order of 250nm, this inevitably leads to pores that will range in size between 50 and 450nm.
机译:我们报告了微制造技术当前的最新技术的实际局限性,这些技术限制了生产高效率支柱阵列列所需的较小支柱尺寸。为此,使用最先进的深紫外光刻技术和深反应离子刻蚀(DRIE)刻蚀技术,制作了9个通道,其柱直径从5到0.5μm不等。所获得的结果与理论上的预期趋势有很大偏差,其中最小板高(H _(min))将随立柱直径线性减小。当直径从4.80微米增加到3.81微米的柱子时,最小平板高度从1.7微米减小到1.2微米,但是随着尺寸的进一步减小,最小平板高度再次上升到2微米左右的值。最小的立柱直径甚至产生最差的最小板高(4μm)。深入扫描电子显微镜(SEM)对不同通道的检查清楚地表明,这些发现可以归因于在探索深紫外光刻和DRIE蚀刻工艺的局限性时不可避免地遇到的微制造局限性。当设计的目标尺寸接近蚀刻分辨率极限时,随着柱尺寸的减小,能带展宽以强烈的非线性方式增加。这种高度非线性的关系可以从第一原理中理解:当加工误差为100-200nm数量级时,并且当柱间距离的目标设计尺寸为250nm数量级时,不可避免地会导致孔尺寸范围在50至450nm之间,我们希望通过纸张高度非线性关系来突出显示。这种高度非线性的关系可以从第一原理中理解:当加工误差为100-200nm数量级时,并且当柱间距离的目标设计尺寸为250nm数量级时,不可避免地会导致孔尺寸范围在50至450nm之间。

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