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Metal-boride interlayers for chemical vapor deposited nanostructured NSD films on 316 and 440C stainless steel

机译:用于在316和440C不锈钢上化学气相沉积纳米结构NSD膜的金属硼化物中间层

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摘要

Nanostructured diamond (NSD) films were deposited by chemical vapor deposition (CVD) on both 440C stainless steel ball bearings and 316 stainless steel discs through the use of a metal-boride interlayer. The interlayer is deposited by means of a novel method using microwave plasma CVD with a feedgas mixture composed of hydrogen (H-2) and diborane (B2H6). Substrate temperature was found to have a profound effect on the boride interlayer composition and stoichiometry, forming either a predominantly CrB or Fe2B interlayer. Fe2B-based interlayers were found to be effective in blocking the mutual diffusion of carbon and iron that would otherwise produce graphitic carbon and lead to poor NSD adhesion. Fully continuous and adhered nanostructured NSD films are grown using this interlayer, particularly on 316 steel discs. (C) 2014 Elsevier B.V. All rights reserved.
机译:通过使用金属硼化物夹层,通过化学气相沉积(CVD)在440C不锈钢球轴承和316不锈钢圆盘上沉积纳米结构金刚石(NSD)膜。通过使用微波等离子体CVD的新方法,用由氢(H-2)和乙硼烷(B2H6)组成的原料气混合物来沉积中间层。发现基材温度对硼化物夹层的组成和化学计量有重要影响,形成了主要的CrB或Fe2B夹层。发现基于Fe2B的中间层可有效阻止碳和铁的相互扩散,否则它们会产生石墨碳并导致不良的NSD附着力。使用该中间层可以生长出完全连续且粘附的纳米结构NSD薄膜,尤其是在316钢圆盘上。 (C)2014 Elsevier B.V.保留所有权利。

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