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Effect of substrate temperature on properties of diamond-like films deposited by combined DC impulse vacuum-arc method

机译:衬底温度对复合直流脉冲真空电弧法沉积类金刚石薄膜性能的影响

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摘要

DLC thin films have been deposited using a combined DC and high power impulse vacuum-arc process. Hardness and adhesion of the obtained films deposited at different substrate temperature were studied using nanohardness testing and the scratch tester REVETEST?. The bonding structure of as-deposited films was analyzed by Raman scattering and X-ray photoelectron spectroscopy. The results show that the substrate temperature is one of the main parameters influencing the sp~3-to-sp~2 ratio of carbon atombonds in the coatings,which in turn affects the film's mechanical properties. XRD analysis shows that a Cr_xC_y interfacial layer forms at 280 °С, which reduces the adhesion properties of the DLC coatings. High quality DLC coatings are obtained by control of the specimen temperature below 280 °C using a sensor that is in direct contact with the substrate.
机译:DLC薄膜已经使用直流和高功率脉冲真空电弧工艺相结合的方法进行了沉积。使用纳米硬度测试和划痕测试仪REVETEST?研究了在不同基材温度下沉积的所得薄膜的硬度和附着力。通过拉曼散射和X射线光电子能谱分析沉积薄膜的结合结构。结果表明,基底温度是影响涂层中碳原子的sp〜3-sp_2比例的主要参数之一,进而影响薄膜的力学性能。 XRD分析表明,Cr_xC_y界面层在280°С处形成,这降低了DLC涂层的粘附性能。通过使用与基材直接接触的传感器将样品温度控制在280°C以下,可以获得高质量的DLC涂层。

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