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Au and Pd atoms adsorbed on pure and Ti-doped SiO_2/Mo(112) films

机译:吸附在纯Ti和掺杂Ti的SiO_2 / Mo(112)膜上的Au和Pd原子

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摘要

The interaction of Pd and Au atoms with a silica surface and SiO_2/Mo(112) ultrathin films has been studied with periodic density-functional theory-generalized gradient approximation calculations.On both unsupported and supported silica,Pd and Au are weakly bound.No charge transfer occurs to the empty Pd and Au orbitals.Differently from Au,Pd can easily penetrate with virtually no barrier into the hexagonal rings of the supported silica film and binds strongly at the SiO_2-Mo interface.The same process for Au implies overcoming a barrier of 0.9 eV.Completely different is the behavior of Ti-doped silica films.Au forms a direct covalent bond with substitutional Ti at the expense of the Ti...O-Mo interface bond which breaks.The global process is exothermic by 1 eV and nonactivated,showing that Ti doping results in solid anchoring points for the adsorbed Au atoms and for nucleation and growth of small gold particles.The effect of Ti doping is less pronounced for Pd but still visible with substantial enhancement of the Pd adsorption strength.
机译:利用周期性密度泛函理论-广义梯度近似计算研究了Pd和Au原子与二氧化硅表面和SiO_2 / Mo(112)超薄膜之间的相互作用。在无支撑和支撑的二氧化硅上,Pd和Au都弱结合。电荷转移到空的Pd和Au轨道上。与Au不同,Pd几乎可以毫无障碍地轻松渗透到负载的二氧化硅薄膜的六角环中,并在SiO_2-Mo界面上牢固结合。 0.9 eV的势垒。完全不同的是掺杂Ti的二氧化硅膜的行为.Au与取代的Ti形成直接共价键,但以破坏Ti ... O-Mo界面键为代价。整体过程放热1 eV和未激活,表明Ti掺杂会导致所吸附的Au原子形成固体锚定点,并导致小金颗粒的成核和生长.Ti掺杂对Pd的影响不明显,但在s时仍然可见大大提高了Pd的吸附强度。

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