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Effects of resistivity on linear plasma responses to resonant magnetic perturbations in tokamak plasmas

机译:电阻率对托卡马克等离子体中线性等离子体对共振磁扰动响应的影响

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摘要

Numerical studies are made of the effects of resistivity on linear plasma responses to resonant magnetic perturbations (RMPs) in tokamaks based on a reduced magnetohydrodynamic model. From a local two-field model, it is suggested that the ratio of the poloidal electron advection to the resistivity diffusion rate alpha(m) can be a figure of merit parameter in linear RMP penetration physics. The shielding efficiency is governed by alpha(m), and when alpha(m) greater than or similar to 1, RMPs are effectively shielded. Global simulations using a four-field model [Hazeltine and Meiss, Phys. Rep. 121, 1 (1985)] show that there exists an effective threshold of the perpendicular electron flow (V-e,perpendicular to(c)) beyond which RMPs cannot penetrate. Resistivity is found to determine V-e,perpendicular to(c) which increases as resistivity becomes higher, making RMP penetration easier. At low resistivity, small V-e,perpendicular to(c) renders the RMP penetration sensitive to ion collisionality and the change in q(95). The kink response is observed to be closely related to the residual level of RMPs at rational surfaces and can be also strongly affected by resistivity. Published by AIP Publishing.
机译:基于简化的磁流体动力学模型,对电阻率对托卡马克中线性等离子体对共振磁扰动(RMP)响应的影响进行了数值研究。从局部两场模型,建议在线性RMP渗透物理学中,极向电子对流与电阻率扩散率alpha(m)的比值可以作为品质因数的一个参数。屏蔽效率由alpha(m)决定,当alpha(m)大于或等于1时,RMP被有效屏蔽。使用四场模型的整体模拟[Hazeltine and Meiss,Phys。 Rep。121,1(1985)]显示存在一个有效的垂直电子流阈值(V-e,垂直于(c)),RMP无法穿透该阈值。发现电阻率确定垂直于(c)的V-e,该电阻率随电阻率变高而增加,从而使RMP渗透更容易。在低电阻率下,垂直于(c)的小V-e使RMP穿透对离子碰撞性和q(95)的变化敏感。观察到扭结响应与合理表面上RMP的残留水平密切相关,并且还可能受到电阻率的强烈影响。由AIP Publishing发布。

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