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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Electrochemically Assisted Generation of Silica Deposits Using a Surfactant Template at Liquid/Liquid Microinterfaces
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Electrochemically Assisted Generation of Silica Deposits Using a Surfactant Template at Liquid/Liquid Microinterfaces

机译:在液体/液体微界面上使用表面活性剂模板电化学辅助生成二氧化硅沉积物

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摘要

The electrochemically assisted generation of mesoporous silica deposits at arrays of microscopic liquid/liquid interfaces was investigated. Ion transfer voltammetry was used in order to initiate the formation of silica material by electrochemical transfer of template species (cetyltrimethylammonium, CTA~+), initially present in the organic phase, to the aqueous phase containing the hydrolyzed silica precursors (tetraethoxysilane, TEOS). The deposition mechanism was investigated using cyclic voltammetry, based on the analysis of diffusion layer profiles of CTA~+ species from the organic side of the interface. The morphology of the deposits varied from hemispherical to almost flat with the potential scan rate, the spacing factor of the microinterfaces array supporting the liquid/liquid interfaces, or the initial CTA~+ and TEOS concentrations, as evidenced by scanning electron microscopy and profilometry analyses. The amount of deposited material can be related to the amount of CTA~+ species passing across the liquid/liquid interfaces. Confocal Raman spectroscopy was used to confirm the presence of surfactant-templated silica deposits and to analyze the effectiveness of calcination in removing the organic molecules filling the interior of the pores. After template removal, the mesoporous network became accessible to external reagents, as checked by interfacial alkylammonium cation transfer, suggesting a possible analytical interest of such modified micro-liquid/liquid interfaces.
机译:研究了在微观液体/液体界面阵列上电化学协助生成的介孔二氧化硅沉积物。使用离子迁移伏安法是为了通过将最初存在于有机相中的模板物质(鲸蜡基三甲基铵,CTA〜+)电化​​学转移到含有水解二氧化硅前体(四乙氧基硅烷,TEOS)的水相中来引发二氧化硅材料的形成。基于循环伏安法,从界面有机侧对CTA〜+物质的扩散层分布进行了分析,研究了沉积机理。扫描电镜和轮廓分析表明,沉积物的形态从半球形到几乎平坦,随电位扫描速率,支持液/液界面的微界面阵列的间隔因子,或初始CTA〜+和TEOS浓度而变化。 。沉积材料的量可以与穿过液/液界面的CTA +种类的量有关。共焦拉曼光谱法用于确认表面活性剂模板二氧化硅沉积物的存在,并分析煅烧在去除填充孔内部有机分子方面的有效性。除去模板后,通过界面烷基铵阳离子转移检查,介孔网络变得可与外部试剂接触,这表明这种修饰的微液/液界面可能具有分析价值。

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