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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Potential-controlled electrochemical seed-mediated growth of gold nanorods directly on electrode surfaces
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Potential-controlled electrochemical seed-mediated growth of gold nanorods directly on electrode surfaces

机译:直接在电极表面上电势受控的电化学种子介导的金纳米棒的生长

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摘要

Here we compare the amount and the morphology of Au nanostructures electrodeposited from a solution containing 2.5 × 10~(-4) M AuCl_4~- and 0.1 M cetyltrimethylammonium bromide (CTAB) onto nonseeded and Au-nanoparticle (NP)-seeded mercaptopropyltrimethoxysilane (MPTMS)-functionalized glass/indium tin oxide (glass/ITO) electrodes as a function of the electrode potential and deposition time. The method is similar to the previously reported seed-mediated chemical synthesis of Au nanorods (NRs) in solution and on surfaces, except that we replace the chemical reducing agent (ascorbic acid) with the electrochemical potential. The deposition can be classified into three different potential ranges on the nonseeded and seeded electrodes on the basis of the amount of Au deposited and the morphology of the deposited nanostructures. On the nonseeded glass/ITO/MPTMS electrode, at potentials ranging from -0.30 to -0.20 V, there are a significant number of Au deposits on the surface with mainly branched morphology. At deposition potentials ranging from -0.10 to 0.27 V, there is very little deposition of Au but the few deposits also have a branched morphology. At 0.27 V and higher, there is no Au deposition on the glass/ITO/MPTMS electrode. Because Au seeds catalyze Au deposition, the three potential ranges, the amount of Au, and the morphologies are quite different on the glass/ITO/MPTMS/Au NP seed electrodes compared to those on the nonseeded glass/ITO/MPTMS electrodes. There is a significant amount of Au (more than on the nonseeded electrode) on the surface over a wider range of potentials from -0.30 to 0.27 V, and they have spherical morphology. From 0.30 to 0.35 V, less Au deposits on the electrode and there are 5-15% Au NRs on the surface in addition to spherical NPs. Above 0.35 V, there is no Au deposition on the glass/ITO/MPTMS/Au seed electrode. For depositions within the potential range of 0.30 to 0.35 V on glass/ITO/MPTMS/Au seed electrodes, the size and shape distributions of the Au nanostructures, including NRs, are similar to those previously synthesized by chemical seed-mediated growth in solution and directly on nonconductive surfaces. The yield, length, and aspect ratio of the Au NRs depend on the deposition time; the average length ranges from about 100 to 400 nm for times of 30 to 120 min. The electrochemical seed-mediated growth of Au is optimal from 0.30 to 0.35 V versus Ag/AgCl under our conditions, which could be useful for enhancing the signal in sensing strategies that employ Au NPs as optical or electrochemical tags.
机译:在这里,我们比较了从含2.5×10〜(-4)M AuCl_4〜-和0.1 M十六烷基三甲基溴化铵(CTAB)的溶液中电沉积到非播种和金纳米粒子(NP)播种的巯基丙基三甲氧基硅烷(MPTMS)上的金纳米结构的数量和形貌功能化的玻璃/氧化铟锡(玻璃/ ITO)电极与电极电势和沉积时间的关系)。该方法类似于先前报道的溶液和表面上的金纳米棒(NRs)的种子介导化学合成,不同之处在于我们用电化学势代替了化学还原剂(抗坏血酸)。基于金的沉积量和所沉积的纳米结构的形态,可以将沉积在非种子和种子电极上分为三个不同的电位范围。在非播种玻璃/ ITO / MPTMS电极上,电势在-0.30至-0.20 V的范围内,表面上存在大量Au沉积,主要具有分支形态。在-0.10至0.27 V范围内的沉积电位下,几乎没有Au沉积,但是少数沉积物也具有分支形态。在0.27 V和更高电压下,玻璃/ ITO / MPTMS电极上没有金沉积。由于Au种子催化Au沉积,因此与非种子玻璃/ ITO / MPTMS电极上的三个电势范围,Au量和形态在玻璃/ ITO / MPTMS / Au NP种子电极上有很大不同。在-0.30至0.27 V的较宽电位范围内,表面上存在大量Au(比非种子电极上的更多),并且它们具有球形形态。从0.30到0.35 V,较少的Au沉积在电极上,除球形NP之外,表面上还有5-15%的Au NR。高于0.35 V时,玻璃/ ITO / MPTMS / Au种子电极上没有Au沉积。对于在玻璃/ ITO / MPTMS / Au种子电极上的0.30至0.35 V电位范围内的沉积,包括NR在内的Au纳米结构的尺寸和形状分布与以前通过溶液和溶液中化学种子介导的生长合成的尺寸和形状分布相似。直接在非导电表面上。 Au NRs的产率,长度和长宽比取决于沉积时间。平均长度为30至120分钟,范围从约100至400 nm。在我们的条件下,相对于Ag / AgCl,电化学种子介导的Au生长在0.30 V至0.35 V范围内最佳,这对于在将Au NPs用作光学或电化学标签的传感策略中增强信号很有用。

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