Simulation comparisons of monitoring strategies in narrow bandpass filters and antireflection coatings

摘要

This study compares and quantifies the simulated effects of noise, index errors, and photometric level errors on different optical monitoring layer termination strategies. A computer program to simulate optical thin film monitoring has been written for this work. The study looked at these termination methods: quartz crystal monitoring, photometric level cut, two types of turning point termination, and percent of optical extrema monitoring. A narrow bandpass filter and a four-layer antireflection coating design were simulated as examples.