Development of Analytical Method for Diffraction Intensity Data Measured with a High-Resolution Synchrotron X-ray Powder Diffractometer with Multiple-Detector System

摘要

A new analytical method to obtain a series of aberration-free diffraction intensity data from the segmented intensity data collected with a high-resolution synchrotron X-ray powder diffractometer with a multiple-detector system has been developed.The method includes(i)adjustment of variation in peak profiles measured with different detectors,(ii)deconvolution of axial-divergence aberration,and(iii)removal of asymmetry introduced by the aberration of the beamline optics.The method has been applied to analyze the diffraction intensity data of a ZnO powder sample(NIST SRM674)measured with a multiple-detector diffractometer(MDS)on the beamline 4B_2 at the Photon Factory,KEK in Tsukuba.The characteristics of the beamline aberration had been separately evaluated by analyzing the diffraction intensity data of Si powder(NIST SRM640b).It has been confirmed that the observed asymmetry caused by the aberrations of the beamline-optics and the diffractometer can certainly be removed by the method.As a result,the integrated diffraction intensity can easily be evaluated by profile fitting method based on application of a simple symmetric model profile function.