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Local optical field variation in the neighborhood of a semiconductor micrograting

机译:半导体微光栅附近的局部光场变化

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The local optical field of a semiconductor micrograting (GaAs, 10 X 10,mu m) is recorded in the middle field region using an optical scanning probe in collection mode at a constant height. The recorded image shows the micrograting with high contrast and a displaced diffraction image. The finite penetration depth of the light leads to a reduced edge resolution in the direction of the illuminating beam while the edge contrast in the perpendicular direction remains high (similar to 100 nm). We use the discrete dipole model to calculate the local optical field to show how the displacement of the diffraction image increases with increasing distance from the surface. (c) 2006 Optical Society of America.
机译:使用光学扫描探针在收集模式下以恒定高度在中间场区域中记录半导体微光栅(GaAs,10 X 10,μm)的局部光场。记录的图像显示具有高对比度的微光栅和位移衍射图像。光的有限穿透深度导致在照明光束方向上的边缘分辨率降低,而垂直方向上的边缘对比度仍然很高(类似于100 nm)。我们使用离散偶极子模型来计算局部光场,以显示衍射图像的位移如何随着距表面距离的增加而增加。 (c)2006年美国眼镜学会。

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