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首页> 外文期刊>Journal of the Optical Society of America, B. Optical Physics >Regulation of photorefractive surface apodized and chirped waveguide arrays
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Regulation of photorefractive surface apodized and chirped waveguide arrays

机译:光折射表面变迹和chi波导阵列的调节

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摘要

The tangent-like and sine-like characteristics in the head and tail regions of photorefractive surface waveguide arrays are elaborately demonstrated, and the regulation of such waveguide arrays on the written beam, background illumination, and external electric field is systematically studied for the first time. For the photorefractive surface apodized waveguide arrays, it is observed that guided mode bands of the fundamental mode gradually split and eventually reach saturation as a result of the influence of the power of photorefractive surface waves on the modulation depth of the refractive index; the period can be effectively adjusted by the wavelength and grazing angle of the written beam. However, there is an interesting chirp near surface for a large grazing angle. For the photorefractive surface nonlinearly chirped waveguide arrays, the amplitude, sign, and initial position of chirp can be conveniently regulated by an external electric field, background illumination, and incident beam, etc., and the modulation depth can also be flexibly adjusted by the influence of external electric fields on the refractive index of substrate. (C) 2016 Optical Society of America
机译:详细说明了光折射表面波导阵列的头部和尾部区域的正弦和正弦特性,并首次系统地研究了这种波导阵列对写入光束,背景照明和外部电场的调节。对于光折射表面变迹的波导阵列,观察到,由于光折射表面波的功率对折射率的调制深度的影响,基本模式的导模带逐渐分裂并最终达到饱和。可以通过写入光束的波长和掠射角度有效地调整周期。但是,对于大掠角,在表面附近会有一个有趣的chi声。对于光折射表面非线性chi波导阵列,可以通过外部电场,背景照明和入射光束等方便地调节chi的幅度,符号和初始位置,并且还可以灵活地调节调制深度。外部电场对基板折射率的影响。 (C)2016美国眼镜学会

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