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首页> 外文期刊>Journal of the Korean Physical Society >Structural, electrical, and multiferroic properties of Aurivillius (Bi7-x La (x) )Fe3Ti3O21 thin films
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Structural, electrical, and multiferroic properties of Aurivillius (Bi7-x La (x) )Fe3Ti3O21 thin films

机译:Aurivillius(Bi7-x La(x))Fe3Ti3O21薄膜的结构,电学和多铁性

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摘要

The effects of La3+- ion doping on the structural, electrical, and multiferroic properties of the six-layered Aurivillius-phase Bi7Fe3Ti3O21 thin film were investigated. A chemical solution deposition method was used to deposit the (Bi7-x La (x) )Fe3Ti3O21 (x = 0 and 0.6) thin films on Pt(111)/Ti/SiO2/Si(100) substrates. The formation of Aurivillius orthorhombic structures was confirmed by using X-ray diffraction and Raman spectroscopy studies. The (Bi6.4La0.6)Fe3Ti3O21 thin film exhibited a low leakage current density (1.84 x 10(-6) A/cm(2) at an applied electric field of 100 kV/cm) and a large remnant polarization (20.20 mu C/cm(2) at an applied electric field of 318 kV/cm) as compared to the Bi7Fe3Ti3O21 thin film. The enhanced electrical and multiferroic properties are ascribed to a reduced oxygen concentration and a structural distortion. Both thin films were weakly ferromagnetic at room temperature.
机译:研究了La3 +-离子掺杂对六层Aurivillius相Bi7Fe3Ti3O21薄膜的结构,电学和多铁性性质的影响。化学溶液沉积方法用于在Pt(111)/ Ti / SiO2 / Si(100)衬底上沉积(Bi7-x La(x))Fe3Ti3O21(x = 0和0.6)薄膜。通过使用X射线衍射和拉曼光谱研究证实了Aurivillius正交结构的形成。 (Bi6.4La0.6)Fe3Ti3O21薄膜在100 kV / cm的施加电场下表现出低的漏电流密度(1.84 x 10(-6)A / cm(2))和大的剩余极化(20.20μ与Bi7Fe3Ti3O21薄膜相比,在318 kV / cm的施加电场下C / cm(2)。增强的电和多铁性能归因于降低的氧浓度和结构变形。两种薄膜在室温下均为弱铁磁性。

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