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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >IMPROVEMENT IN THE PHOTOLUMINESCENCE EFFICIENCY OF POROUS SILICON USING HIGH-ENERGY SILICON ION IRRADIATION
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IMPROVEMENT IN THE PHOTOLUMINESCENCE EFFICIENCY OF POROUS SILICON USING HIGH-ENERGY SILICON ION IRRADIATION

机译:高能硅离子辐照提高多孔硅的光致发光效率

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An order of magnitude enhancement in the intensity of visible room temperature photoluminescence (PL) from porous silicon (PS) was observed when irradiated with 10 MeV (7(+)) silicon ions from a pelletron source. The effect was associated with a blue shift of 70 nm. The stability of PL with respect to ambients was seen to be remarkably improved. The energy band gap determined from photoluminescence and photoreflectance measurements indicated a shift from 1.67 eV to 1.83 eV. Subsequently partial restructuring of Si-O-Si and Si-H type species into Si-OH was confirmed by infrared measurements recorded before and after irradiation. The effects have been correlated to a reduction in the extent of non radiative recombination centres as a consequence of chemical restructuring of the surface. By assuming that the restructured surface is sufficiently thick to reduce the crystallite size, the blue shift can be accounted for. Formation of Si-OH bonds at the surface was also observed when PS was intentionally exposed to low-energy (10-30 eV) OH- ions from an electron cyclotron resonance (ECR) plasma; associated with this, the PL intensity was enhanced. [References: 11]
机译:当用来自球状电子源的10 MeV(7(+))硅离子照射时,观察到多孔硅(PS)的可见室温光致发光(PL)强度提高了一个数量级。该效果与70nm的蓝移有关。观察到PL相对于环境的稳定性得到显着改善。由光致发光和光反射率测量确定的能带隙表明从1.67 eV转变为1.83 eV。随后通过照射前后记录的红外测量结果确认了Si-O-Si和Si-H型物质部分重组为Si-OH。由于表面化学结构的改变,这种影响与非辐射复合中心的减少有关。通过假设重组表面足够厚以减小微晶尺寸,可以考虑蓝移。当PS故意暴露于来自电子回旋共振(ECR)等离子体的低能(10-30 eV)OH-离子时,在表面上也会形成Si-OH键。与此相关,PL强度增强。 [参考:11]

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