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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Size and shape dependences on magnetization reversal in ferromagnetic/antiferromagnetic bilayer patterned into nano-dot arrays
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Size and shape dependences on magnetization reversal in ferromagnetic/antiferromagnetic bilayer patterned into nano-dot arrays

机译:尺寸和形状取决于图案化成纳米点阵列的铁磁/反铁磁双层中的磁化反转

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摘要

Magnetization reversal in exchange biased Co/CoO dot arrays has been investigated systematically as a function of shape anisotropy, dot size, temperature, cooling field and training effect. Polycrystalline 24 nm Co films have been sputtered on a pre-patterned Si/SiO2 substrate with the lateral dimensions of the dots varying from 200 to 900 nm at a fixed spacing of 800 nm. The Co dots have been oxidized using pure oxygen to create a Co/CoO bilayer. Below the Neel temperature, the hysteresis loop of this bilayer displays a normal unidirectional shift due to the exchange bias in the continuous film, while the patterned film displays an additional anomaly of the upper part of the hysteresis loop. This anomaly, which is shape dependent, increases with decreasing temperature and cooling field. On the other hand, it decreases for the trained loops with increasing aspect ratio (length/width) of the patterned dot. This anomaly is probably caused by incomplete biasing due to the competition between magnetostatic inter-dot interactions and exchange bias.
机译:系统地研究了交换偏置的Co / CoO点阵列中的磁化反转与形状各向异性,点尺寸,温度,冷却场和训练效果的关系。已经在预图案化的Si / SiO2衬底上溅射了多晶24 nm Co膜,点的横向尺寸从200到900 nm不等,固定间隔为800 nm。使用纯氧将Co点氧化,以创建Co / CoO双层。在Neel温度以下,由于连续薄膜中的交换偏压,该双层的磁滞回线会显示正常的单向位移,而图案化膜会显示磁滞回线上部的其他异常情况。这种形状相关的异常随着温度和冷却场的减小而增加。另一方面,对于训练的循环,随着图案化点的纵横比(长度/宽度)增加,它减小。这种异常可能是由于静磁点间相互作用与交换偏压之间的竞争而导致的不完全偏压所致。

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