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Fabrication of a Cr thin-film AEM characterization standard

机译:Cr薄膜AEM表征标准的制作

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The need for an analytical electron microscope (AEM) characterization standard capable of determining the consistency and relative quality of analytical performance has become increasingly evident as advances in the instrumentation are(-)made. In this paper the fabrication of a Cr thin-film AEM standard by conventional thermal evaporation techniques is described. A 100-nm-thick Cr film on a 20-nm C- support film provided by the National Institute of Standards and Technology (NIST) served as a model against which the present film was evaluated. Improvements over the NIST film in terms of diffraction pattern clarity and simplification of parallel electron energy-loss spectrometry (PEELS) analysis were achieved by removal of the C-support film and the creation of a self-supported Cr (SS-Cr) film. Qualitative grain-size comparisons between the MST model and the SS-Cr films made by scanning transmission electron microscopy found the SS-Cr films to have a slightly larger grain size. Thickness measurements were verified by X-ray energy dispersive spectrometry, PEEKS and field-emission gun scanning electron microscopy. SS-Cr film standard specimens are available for use by the AEM community by contacting the authors directly. [References: 15]
机译:随着仪器技术的进步,对能够确定分析性能的一致性和相对质量的分析电子显微镜(AEM)表征标准的需求日益明显。在本文中,描述了通过常规热蒸发技术制备Cr薄膜AEM标准溶液的方法。由美国国家标准技术研究院(NIST)提供的20 nm C支撑膜上的100 nm厚Cr膜用作评估本膜的模型。通过去除C支撑膜并创建自支撑Cr(SS-Cr)膜,可以实现NIST膜在衍射图样清晰度和简化平行电子能量损失谱(PEELS)分析方面的改进。通过扫描透射电子显微镜对MST模型和SS-Cr膜进行定性的晶粒尺寸比较,发现SS-Cr膜的晶粒尺寸稍大。厚度测量通过X射线能量色散光谱法,PEEKS和场发射枪扫描电子显微镜进行验证。通过直接联系作者,AEM社区可以使用SS-Cr薄膜标准样品。 [参考:15]

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