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A novel p-type half-Heusler from high-throughput transport and defect calculations

机译:高通量传输和缺陷计算的新型p型半霍斯勒

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In this work we identify p-type half-Heusler thermoelectric candidates using high-throughput techniques. Multiple descriptors are used to evaluate transport properties, elemental abundancies and thermodynamic stabilities. We identify the known (V/Nb/Ta)FeSb and (Zr/Hf)CoSb compounds as well as a novel encouraging (Nb/Ta)CoSn half-Heuslers system. We then use state of the art defect thermochemistry calculations to rule out any intrinsic doping limitations and thereafter predict extrinsic dopants for each candidates. We demonstrate that the defect calculations agree well with existing experiments for the known systems, where we also provide new routes to achieve p-doping. For the (Nb/Ta)CoSn system, group IV transition metals (Ti,Zr,Hf) are predicted as the specific dopant choices to realize their potential as high-performance p-type half-Heusler thermoelectrics. The electronic structure of the half-Heuslers are also analysed using molecular orbital theory to understand the origins of favorable p-type transport properties.
机译:在这项工作中,我们使用高通量技术确定p型半霍斯勒热电候选物。多个描述符用于评估运输性质,元素丰度和热力学稳定性。我们确定已知的(V / Nb / Ta)FeSb和(Zr / Hf)CoSb化合物,以及新型的令人鼓舞的(Nb / Ta)CoSn半Heuslers系统。然后,我们使用最新的缺陷热化学计算方法来排除任何固有的掺杂限制,然后预测每个候选的外在掺杂剂。我们证明缺陷计算与已知系统的现有实验非常吻合,在该系统中我们还提供了实现p掺杂的新途径。对于(Nb / Ta)CoSn系统,预计将IV组过渡金属(Ti,Zr,Hf)作为实现其作为高性能p型半霍斯勒热电势潜力的特定掺杂剂选择。还使用分子轨道理论分析了半霍斯勒管的电子结构,以了解有利的p型传输性质的起源。

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