首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >N-Alkyl functionalized barbituric and thiobarbituric acid bithiophene derivatives for vacuum deposited n-channel OFETs
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N-Alkyl functionalized barbituric and thiobarbituric acid bithiophene derivatives for vacuum deposited n-channel OFETs

机译:N-烷基官能化的巴比妥酸和硫代巴比妥酸联噻吩衍生物,用于真空沉积n通道OFET

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摘要

A family of barbituric and thiobarbituric acid end capped small molecule semiconductors were synthesized, characterized and shown to exhibit n-channel organic thin film transistor properties. By changing the N-alkyl substituent from methyl to ethyl, a dramatic increase in electron mobilities was observed with values nearing 0.3 cm~2 V~(-1) s~(-1).
机译:合成了一组巴比妥酸和硫代巴比妥酸端基封端的小分子半导体,表征并显示出其具有n沟道有机薄膜晶体管特性。通过将N-烷基取代基从甲基改变为乙基,观察到电子迁移率显着增加,其值接近0.3 cm〜2 V〜(-1)s〜(-1)。

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