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首页> 外文期刊>Journal of nanoscience and nanotechnology >Fabrication of Highly-Ordered Nanopatterned Copper Nanowire Arrays by Photolithography
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Fabrication of Highly-Ordered Nanopatterned Copper Nanowire Arrays by Photolithography

机译:通过光刻法制备高度有序的纳米图案化铜纳米线阵列。

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摘要

Two different patterns, one being circular and the other being QDU, of copper (Cu) nanowire arrays were successfully produced by electrochemical deposition and photolithography. The highly-ordered patterns of Cu nanowire arrays were observed to stand freely on the substrate using scanning electron microscopy (SEM). Chemical analyses have been performed on Cu nanowires using energy dispersive X-ray spectroscopy (EDS). The results confirmed that it is mainly composed of Cu. Selected-area electron diffraction (SAED) pattern indicated the nanowires are single crystalline and the growth direction of the nanowires is along the [220] direction. With the deposition time increasing, the length of Cu nanowires increaseed.
机译:通过电化学沉积和光刻技术成功地制造了铜(Cu)纳米线阵列的两种不同图案,一种是圆形的,另一种是QDU的。使用扫描电子显微镜(SEM),观察到Cu纳米线阵列的高度有序的图案可自由站立在基板上。已经使用能量色散X射线光谱法(EDS)对Cu纳米线进行了化学分析。结果证实其主要由Cu组成。选定区域电子衍射(SAED)模式表明纳米线为单晶,纳米线的生长方向为[220]方向。随着沉积时间的增加,Cu纳米线的长度增加。

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