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首页> 外文期刊>Journal of Modern Optics >A comparison of avalanche breakdown probabilities in semiconductor materials
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A comparison of avalanche breakdown probabilities in semiconductor materials

机译:半导体材料中雪崩击穿概率的比较

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摘要

Using a hard dead space impact ionization model, the dependence of breakdown probabilities on overbias ratio in single photon avalanche diodes is investigated theoretically in a variety of semiconductor materials for the simple case of constant electric field, that is, in a p~+-i-n~+ diode structure. By using avalanche widths of 2 μm, the effects of dead space are minimized so that the breakdown probability results are determined primarily by the enabled ionization coefficients of the materials. The results illustrate how the slope of breakdown probability with overbias ratio is affected by the enabled ionization coefficients ratio and by the field dependences of ionization coefficients, which should be taken into account when choosing semiconductor materials for single photon avalanche diodes.
机译:使用硬死区碰撞电离模型,在简单的恒定电场情况下,即在ap〜+ -in〜中,理论上研究了多种半导体材料中单光子雪崩二极管击穿概率对过偏压比的依赖性。 +二极管结构。通过使用2μm的雪崩宽度,可以将死区的影响降到最低,因此击穿概率的结果主要取决于材料的电离系数。结果表明,击穿概率与过偏置比的斜率如何受启用的电离系数比和电离系数的场依赖性的影响,在为单光子雪崩二极管选择半导体材料时应予以考虑。

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