...
首页> 外文期刊>Journal of industrial and engineering chemistry >Characterization of Cu(In,Ga)Se2 thin films prepared by RF magnetron sputtering using a single target without selenization
【24h】

Characterization of Cu(In,Ga)Se2 thin films prepared by RF magnetron sputtering using a single target without selenization

机译:通过射频磁控溅射使用单一靶材进行无硒化制备的Cu(In,Ga)Se2薄膜的表征

获取原文
获取原文并翻译 | 示例
           

摘要

Cu(In_(1-x)Ga_x)Se2 (CIGS) thin films were prepared using a single quaternary target by RF magnetron sputtering. The effects of deposition parameters on the structural, compositional and electrical properties of the films were examined in order to develop the deposition process without post-deposition selenization. From X-ray diffraction analysis, as the substrate temperature and Ar pressure increased and RF power decreased, the crystallinity of the films improved. The scanning electron microscopy revealed that the grains became uniform and circular shape with columnar structure with increasing the substrate temperature and Ar pressure, and decreasing the RF power. The carrier concentration of CIGS films deposited at the substrate temperature of 500 °C was 2.1 x 10~(17) cm~(-3) and the resistivity was 27 O cm. At the substrate temperature above 500 °C, In and Se contents in CIGS films decreased due to the evaporation and it led to the deterioration of crystallinity. It was confirmed that CIGS thin films deposited at optimal condition had similar atomic ratio to the target value even without post-deposition selenization process.
机译:使用单个四元靶通过射频磁控溅射制备Cu(In_(1-x)Ga_x)Se2(CIGS)薄膜。为了在没有沉积后硒化的情况下发展沉积过程,研究了沉积参数对薄膜结构,组成和电学性质的影响。根据X射线衍射分析,随着基板温度和Ar压力的升高以及RF功率的降低,薄膜的结晶度得到改善。扫描电镜观察发现,随着基板温度和氩气压力的升高,射频功率的降低,晶粒逐渐变为具有圆柱状的均匀圆形结构。在500℃的衬底温度下沉积的CIGS薄膜的载流子浓度为2.1 x 10〜(17)cm〜(-3),电阻率为27 O cm。在高于500°C的衬底温度下,CIGS膜中的In和Se含量由于蒸发而降低,并导致结晶度降低。可以肯定的是,即使没有沉积后的硒化工艺,在最佳条件下沉积的CIGS薄膜也具有与目标值相似的原子比。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号