A Method for Combinatorial Fabrication and Characterion of Organic/Inorganic Thin Film Devices in UHV

摘要

Using the dynamic shadow mask technique,one can fabricate clean structures in ultrahigh vacuum(UHV) with laterl dimensions down to the nanoscale.For this, a perforated membranes is moed with high precision in close proximity to the substrate during exposure to a molscular beam.