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首页> 外文期刊>Surface & Coatings Technology >Vacuum arc deposition of TiN, NbN and TiN/NbN multi-layer coatings
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Vacuum arc deposition of TiN, NbN and TiN/NbN multi-layer coatings

机译:TiN,NbN和TiN / NbN多层涂层的真空电弧沉积

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Single-layer coatings of TiN and NbN, and multi-layer coatings of TiN/NbN, were deposited onto WC-Co substrates using a triple-cathode vacuum arc plasma gun connected to a cylindrical plasma duct onto which an axial magnetic field was imposed. Additional magnetic fields were applied by two beam steering coils orientated normal to the duct axis. The magnetic field produced by the steering coils directed the plasma beam onto a substrate placed on the system axis, increasing the plasma flux to the sample. The single-layer coatings were produced by generating Ti or Nb plasmas in a nitrogen background at a pressure P in the range of 0.67 to 2.67 Pa. Multi-layer coatings with 20, 50 and 100 layers were deposited by alternately switching the arcs on Ti and Nb cathodes. Coating structure and composition were studied by means of scanning electron microscopy (SEM) and X-ray diffraction (XRD). Microhardness and adhesion to the substrate were studied by Vickers' micro-indentation and scratch tests, respectively. It was shown that the phase composition of the NbN coatings depended on the deposition rate and P. The coatings deposited at low deposition rate (i.e. without the beam steering field) exhibited a single-phase cubicδ-NbN structure at P≥0.67 Pa, whereas the coatings deposited with application of the beam steering field, at P=0.67 and 1.33 Pa, were composed of a mixture of cubicδ-NbN and hexagonal NbN{sub}0.95, while at P = 2 and 2.67 Pa, the hexagonal phase was not found. The phase composition of the TiN coatings was independent of the deposition rate and P in the range 0.67-2.67 Pa. The highest microhardness (up to 38 GPa) and scratch critical load (80-95 N) were obtained for single-phase 3-NbN coatings deposited at p=0.67-l.33 Pa and at low deposition rate. The microhardness of multi-layer TiN/NbN coatings of 3.2-3.6μm total thickness increased with increasing number 9f alternating layers, but did not exceed that of the pureδ-NbN observed in this study.
机译:使用三极真空电弧等离子枪将TiN和NbN的单层涂层以及TiN / NbN的多层涂层沉积到WC-Co基板上,该三极真空电弧等离子体枪连接到圆柱形等离子管,并在其上施加轴向磁场。垂直于导管轴方向的两个波束控制线圈施加了额外的磁场。转向线圈产生的磁场将等离子束引导到放置在系统轴上的基板上,从而增加了到达样品的等离子通量。单层涂层是通过在氮气背景下以0.67至2.67 Pa的压力P产生Ti或Nb等离子体产生的。通过交替切换电弧在Ti上沉积20层,50层和100层的多层涂层和Nb阴极。通过扫描电子显微镜(SEM)和X射线衍射(XRD)研究涂层的结构和组成。分别通过维氏显微压痕和划痕试验研究了显微硬度和对基材的附着力。结果表明,NbN涂层的相组成取决于沉积速率和P。以低沉积速率沉积的涂层(即没有束流转向场)在P≥0.67Pa时表现出单相立方δ-NbN结构,而在P = 0.67和1.33 Pa的条件下,在施加束转向场的情况下沉积的涂层由立方δ-NbN和六方NbN {sub} 0.95的混合物组成,而在P = 2和2.67 Pa时,六方相没有找到了。 TiN涂层的相组成与沉积速率和P无关,范围为0.67-2.67 Pa。对于单相3,获得了最高的显微硬度(最高38 GPa)和划痕临界载荷(80-95 N)。 NbN涂层以p = 0.67-1.33 Pa且低沉积速率沉积。总厚度为3.2-3.6μm的多层TiN / NbN涂层的显微硬度随9f交替层数的增加而增加,但不超过本研究中观察到的纯δ-NbN的显微硬度。

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