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首页> 外文期刊>The Journal of Chemical Physics >ELECTRON-IMPACT EXCITATION OF LOW-LYING PREIONIZATION-EDGE N-]SIGMA-ASTERISK AND RYDBERG TRANSITIONS OF CHF2CL AND CHFCL2 - ABSOLUTE GENERALIZED OSCILLATOR STRENGTH MEASUREMENT
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ELECTRON-IMPACT EXCITATION OF LOW-LYING PREIONIZATION-EDGE N-]SIGMA-ASTERISK AND RYDBERG TRANSITIONS OF CHF2CL AND CHFCL2 - ABSOLUTE GENERALIZED OSCILLATOR STRENGTH MEASUREMENT

机译:CHF2CL和CHFCL2的低阶电离边缘N-] SIGMA-ASTERISK和RYDBERG跃迁的电子冲击激励-绝对广义振荡器强度测量

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Angle-resolved electron energy loss spectroscopy has been used to determine the absolute generalized oscillator strengths (GOSs) of valence-shell electronic transitions of difluorochloromethane (CHF2Cl) and dichlorofluoromethane (CHFCl2) as functions of energy loss and momentum transfer at an impact energy of 2.5 keV. Absolute GOS profiles of the prominent low-lying preionization-edge energy loss features of CHF2Cl and CHFCl2 were determined and found to be consistent with the previous assignments of the underlying transitions made by VUC photoabsorption spectroscopy. In particular, the lowest-lying features at 8.0 eV in CHF2Cl and at 7.5 eV in CHFCl2 have been attributed predominantly to electronic excitations from the Cl 3p nonbonding (n) orbitals to the C-Cl sigma* antibonding orbital, in good accord with single-excitation configuration interaction (CI) excited-state calculations. The corresponding GOS profiles of these n(Cl 3p)-->sigma*(C-Cl) (HOMO-->LUMO) transitions revealed an interesting trend of increased dipole character with increasing Cl content, i.e., from an essentially quadrupole-dominated profile, characterized by a maximum at K-2 similar to 0.9 a.u., in CHF2Cl to a mixed dipole-quadrupole profile in CHFCl2 and CHCl3. The CI calculations further showed that some of the underlying n(CI 3p)-->sigma*(C-Cl) transitions in CHF2Cl, CHFCl2, and CHCl3, like the other chlorofluorocarbons: CF3Cl, CF2Cl2, CFCl3, and CCl4, could lead to dissociation of the C-CI bond. In addition, the GOS profiles of the remaining low-lying preionization-edge features at 9.8 and 11.2 eV in CHF2Cl and at 9.4, 10.7, and 11.6 eV in CHFCl2 were also determined. These features have been previously assigned as Rydberg transitions originated from the nonbonding HOMOs. In particular, these experimental GOS profiles were found to be dominated by a strong maximum at K=0, which is indicative of strong dipole interactions. The weak secondary maxima observed at K-2 similar to 2.8-3.5 a.u. could be interpreted qualitatively in terms of the spatial overlaps between the initial-state and final-state orbital wave functions. Together with our earlier work on CHF3 and CHCl3, the present work on the remaining members of the CHFmCl3-m (m=0-3) series, CHF2Cl and CHFCl2, provides further evidence for the empirical trends on the preionization-edge structures observed in the CFnCl4-n (n=0-4) series. (C) 1995 American Institute of Physics. [References: 44]
机译:角分辨电子能量损失谱已被用于确定二氟氯甲烷(CHF2Cl)和二氯氟甲烷(CHFCl2)的价壳电子跃迁的绝对广义振子强度(GOS)作为能量损失和动能传递的函数,其冲击能量为2.5 keV。确定了CHF2Cl和CHFCl2的突出的低层电离边缘能量损失的特征的绝对GOS分布图,发现该分布与VUC光吸收光谱法对基础转变的先前分配相符。尤其是,CHF2Cl中的8.0 eV和CHFCl2中的7.5 eV的最低说谎特征主要归因于从Cl 3p非键(n)轨道到C-Cl sigma *反键轨道的电子激发,这与单个激励配置交互(CI)激励状态计算。这些n(Cl 3p)-> sigma *(C-Cl)(HOMO-> LUMO)跃迁的相应GOS分布揭示了一个有趣的趋势,即随着Cl含量的增加,偶极子特性增加,即基本上由四极子主导CHF2Cl中的K-2最大值与0.9 au相似,CHFCl2和CHCl3中的偶极-四极杆混合峰。 CI的计算进一步表明,CHF2Cl,CHFCl2和CHCl3中某些潜在的n(CI 3p)-> sigma *(C-Cl)跃迁,像其他氯氟烃:CF3Cl,CF2Cl2,CFCl3和CCl4一样,可能导致解离C-CI键。此外,还确定了CHF2Cl中9.8和11.2 eV以及CHFCl2中9.4、10.7和11.6 eV的其余低洼电离边缘特征的GOS分布图。这些功能先前已被指定为源自非键合HOMO的Rydberg过渡。特别是,发现这些实验性GOS谱主要由K = 0处的强最大值决定,这表明强偶极子相互作用。在K-2处观察到的弱次要最大值类似于2.8-3.5 a.u.可以用初始状态和最终状态的轨道波函数之间的空间重叠来定性地解释。加上我们先前对CHF3和CHCl3的研究,目前对CHFmCl3-m(m = 0-3)系列其余成员CHF2Cl和CHFCl2的研究为在离子化前缘结构中观察到的经验趋势提供了进一步的证据。 CFnCl4-n(n = 0-4)系列。 (C)1995年美国物理研究所。 [参考:44]

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