RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture

摘要

An exciplex halogen source of UV radiation that is excited by an rf transverse discharge is studied experimentally. The active medium of the source is an Ar-Xe-Cl-2 mixture kept at a low pressure (100-1000 Pa), and its working spectral range is 220-450 nm. The radiation spectrum contains 235 nm XeCl(D-X), 257 nm Cl-2(D'-A'), 1 306 nm XeCl(B-X), 390 nm XeCl(C-A), and 430 nm XeCl(B-A) lines. The results of optimization of the UV power as a function of the pressure, Ar-Xe-Cl-2 mixture composition, and excitation power are reported.