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首页> 外文期刊>Protection of Metals >Electrochemical Behavior of Some Electroplates in Solutions for Coulometric Measurements of Their Thickness. III. Passivation Phenomena during the Dissolution of Copper Coatings
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Electrochemical Behavior of Some Electroplates in Solutions for Coulometric Measurements of Their Thickness. III. Passivation Phenomena during the Dissolution of Copper Coatings

机译:库仑测量厚度的溶液中某些电镀液的电化学行为。三,铜涂层溶解过程中的钝化现象

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Anodic dissolution of copper in NH_4NO_3 solutions of different concentrations was studied by potentiodynamic and chronoammetric methods. It was found that the nitrate salt film starts to form at the anode when the anodic current density reaches approximately two thirds of its maximum on the voltammograms. Immediately after the maximum, the passivating effect of the salt is enhanced by the presence of copper oxidation products, most probably CuO. Chronopotentiometric study of copper dissolution revealed that the optimum concentration of NH_4NO_3 in the working solution should be in a range from 100 to 200 g/l for reliable coulometric measurements of the copper coating thickness. The current edition of the relevant ISO standard gives no formulation of electrolyte suitable for quick measurement of the thickness of copper coatings.
机译:通过电位动力学和计时电流法研究了铜在不同浓度的NH_4NO_3溶液中的阳极溶解。已经发现,当阳极电流密度达到伏安图上其最大值的大约三分之二时,硝酸盐膜开始在阳极处形成。达到最大值后,立即通过铜氧化产物(最可能是CuO)的存在增强了盐的钝化效果。铜溶解的计时电位法研究表明,工作液中NH_4NO_3的最佳浓度应在100至200 g / l的范围内,以便可靠地用电量分析法测量铜涂层的厚度。相关ISO标准的当前版本未提供适合快速测量铜涂层厚度的电解质配方。

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