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首页> 外文期刊>Polymer bulletin >Grazing-incidence wide-angle X-ray diffraction study on molecular aggregation state of imprinted polyimide film before and after hard baking
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Grazing-incidence wide-angle X-ray diffraction study on molecular aggregation state of imprinted polyimide film before and after hard baking

机译:硬烘烤前后压印聚酰亚胺膜分子聚集态的掠入射广角X射线衍射研究

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摘要

Nanoimprint lithography (NIL) was carried out on precursor of polyimide (PI), poly(amic acid) film, and then hard baking to obtain imprinted PI film. The molecular aggregation states of imprinted PI films before and after hard baking were investigated by grazing-incidence wide-angle X-ray diffraction comparing with the one of flat PI film. It was found that NIL and hard baking can strongly affect the molecular aggregation states of PI film. Before hard baking, PI chain is aligned parallel to the line direction on the line. After hard baking, the alignment in ordered domain was changed to that the PI molecule of which chain axis is perpendicular to the line direction is significantly increased, while, PI molecule of which chain axis is parallel to the line direction is decreased after hard baking. Through comparing with the flat PI, crystallinity of imprinted PI film has been significantly enhanced.
机译:对聚酰亚胺(PI)的前体,聚(酰胺酸)膜进行纳米压印光刻(NIL),然后进行硬烘烤以获得压印的PI膜。与平面PI膜相比,通过掠入射广角X射线衍射研究了硬烘烤前后印迹PI膜的分子聚集状态。发现NIL和硬烘烤可强烈影响PI膜的分子聚集状态。在硬烤之前,PI链与生产线上的生产线方向平行对齐。硬烘烤后,有序域的排列改变为链轴垂直于线方向的PI分子显着增加,而链轴平行于线方向的PI分子在硬烘烤后降低。通过与平面PI进行比较,可以明显提高印迹PI膜的结晶度。

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