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Iridium coating deposited by double glow plasma technique - Effect of glow plasma on structure of coating at single substrate edge

机译:通过双辉光等离子体技术沉积的铱涂层-辉光等离子体对单衬底边缘的涂层结构的影响

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摘要

Double glow plasma technique has a high deposition rate for preparing iridium coating. However, the glow plasma can influence the structure of the coating at the single substrate edge. In this study, the iridium coating was prepared by double glow plasma on the surface of single niobium substrate. The microstructure of iridium coating at the substrate edge was observed by scanning electron microscopy. The composition of the coating was confirmed by energy dispersive spectroscopy and X-ray diffraction. There was a boundary between the coating and the substrate edge. The covered area for the iridium coating at the substrate edge became fewer and fewer from the inner area to the outer flange-area. The bamboo sprout-like particles on the surface of the substrate edge were composed of elemental niobium. The substrate edge was composed of the Nb coating and there was a transition zone between the Ir coating and the Nb coating. The interesting phenomenon of the substrate edge could be attributed to the effects of the bias voltages and the plasma cloud in the deposition chamber. The substrate edge effect could be mitigated or eliminated by adding lots of small niobium plates around the substrate in a deposition process.
机译:双辉等离子体技术具有高的沉积速率,用于制备铱涂层。但是,辉光等离子体会影响单个基板边缘处的涂层结构。在这项研究中,铱涂层是通过在单个铌基体表面上的双辉光等离子体制备的。通过扫描电子显微镜观察在基板边缘的铱涂层的微观结构。涂层的组成通过能量色散光谱法和X射线衍射确认。在涂层和基底边缘之间存在边界。从内部区域到外部凸缘区域,在基板边缘的铱涂层的覆盖区域变得越来越少。基体边缘表面上的竹芽状颗粒由元素铌组成。基底边缘由Nb涂层组成,在Ir涂层和Nb涂层之间有一个过渡区。基板边缘的有趣现象可归因于沉积室中偏压和等离子体云的影响。通过在沉积过程中在基板周围添加许多小的铌板,可以减轻或消除基板边缘效应。

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