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首页> 外文期刊>IEEE transactions on very large scale integration (VLSI) systems >High-Volume Testing and DC Offset Trimming Technique of On-Die Bandgap Voltage Reference for SOCs and Microprocessors
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High-Volume Testing and DC Offset Trimming Technique of On-Die Bandgap Voltage Reference for SOCs and Microprocessors

机译:高批量试验和DC偏移修整技术对SOC和微处理器的导通带隙电压参考

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摘要

Since the VLSI chips were invented, as predicted by Moore's law, the performance, the power, and the cost of the VLSI chips have been improved, which brought a significant benefit to the economy. However, some of the analog circuits do not get a full benefit from the scaling, due to the increased device variability with transistors in smaller dimension. Under such circumstance, the calibration and trimming techniques are essential to overcome the sensitivity to the process variation. This paper presents the trimming technique to correct the direct current (dc) offset error of the bandgap voltage reference circuit, which complies with the high-volume manufacturing (HVM) requirements. The proposed trimming method consists of the combination of two different sequences, the coarse and fine trimming. The accuracy of the dc offset trimming is evaluated by the newly invented method that complies with the HVM requirements. With a compact silicon area of only 700 mu m(2), the dc offset trimming circuit achieved an accuracy of +/- 5 mV (4 sigma) as a result of the coarse and fine trimming operations.
机译:由于VLSI芯片被发明,因此由Moore的法律预测,VLSI芯片的性能,力量和成本得到了改善,这对经济带来了重大好处。然而,由于具有较小尺寸的晶体管的装置变化增加,一些模拟电路不会从缩放中获得完全好处。在这种情况下,校准和修整技术对于克服对过程变化的敏感性是必不可少的。本文介绍了修剪技术,以校正带隙电压参考电路的直流(DC)偏移误差,符合大容量制造(HVM)要求。所提出的修剪方法包括两个不同序列的组合,粗糙和细小的修剪。通过符合HVM要求的新发明方法评估DC偏移修整的精度。具有仅为700 mu m(2)的紧凑型硅面积,DC偏移修剪电路由于粗略和精细的修剪操作而实现了+/- 5 mV(4 sigma)的精度。

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