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Wavelength dependent negative and positive persistent photoconductivity in Sn δ-doped GaAs structures

机译:Snδ掺杂GaAs结构中与波长有关的负和正持久光电导

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The photoconductivity of GaAs structures b-doped by Sn has been investigated for wavelengths λ = 650-1200 nm in the temperature interval T = 4.2-300 K. The electron densities and mobilities, before and after illumination, have been determined by magnetoresistance, Shubnikov--de Haas effect and Hall effect measurements, in high magnetic fields. For the heavily doped structures (Hall density n_H > 2 × 10~13 cm~-2) we observe under illumination by light with wavelengths larger than the bandgap wavelength of the host material (λ = 815 nm at T = 4.2 K) first positive (PPPC) and then negative (NPPC) persistent photoconductivity. The NPPC is attributed to the ionization of DX centres and PPPC is explained by the excitation of electrons from Cr impurity states in the substrate. For λ < 815 nm, in addition, the excitation of electrons over the bandgap of GaAs contributes to the PPPC. For the lightly doped structures (n_H ≤ 2 × 10~13 cm~-2) the photoconductivity effect is always positive.
机译:已经研究了在温度间隔T = 4.2-300 K下,掺有Sn的GaAs结构的光电导率在波长λ= 650-1200 nm时。通过磁阻Shubnikov确定了照明前后的电子密度和迁移率在强磁场中的--de哈斯效应和霍尔效应测量。对于重掺杂结构(霍尔密度n_H> 2×10〜13 cm〜-2),我们在光照下观察到波长大于主体材料的带隙波长(λ= 815 nm,T = 4.2 K)的第一正(PPPC),然后是负(NPPC)持久光电导。 NPPC归因于DX中心的电离,而PPPC则是通过激发衬底中Cr杂质态的电子来激发的。另外,对于λ<815 nm,GaAs带隙上电子的激发也有助于PPPC。对于轻掺杂结构(n_H≤2×10〜13 cm〜-2),光电导效应始终为正。

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