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The incorporation and diffusivity of As in Hg_0.8Cd_0.2Te

机译:Hg_0.8Cd_0.2Te中As的掺入和扩散

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摘要

The dependence to be expected by the experimentally observed diffusivity of As in Hg_0.8Cd_0.2Te, D(As), on the Hg pressure, P_Hg, and on the As concentration has been calculated for various modes of As incorporation described in the literature and for interstitial and vacancy diffusion mechanisms. Comparison with experimental data which shows D(As) to be independent of As concentration (at least up to 5 x 10~18 cm~-3), to vary as 1 /P_Hg at moderate pressures and as 1/P_Hg~3, at high pressures, confirms that these features can only be accounted for if As substitutes on the cation sub--lattice as As_Hg and on the anion sub-lattice as As_Te. Diffusion occurs on the cation sub-lattice due to the mobile As_Hg diffusing by a vacancy mechanism. Significant concentrations of As dimer or tetramer complexes give rise to D(As) depending on the As concentration as well as incorrect variations with P_Hg. A further important result is that Hg_0.8Cd_0.2Te is electrically intrinsic for these As concentrations down to at least 250 ℃.
机译:对于文献中描述的各种形式的As掺入,已经计算出了通过实验观察到的H在Hg_0.8Cd_0.2Te,D(As)中的As扩散率,Hg压力P_Hg和As浓度的依赖关系。用于间隙和空位扩散机制。与实验数据的比较表明D(As)与As浓度无关(至少高达5 x 10〜18 cm〜-3),在中等压力下变化为1 / P_Hg,在1压力下变化为1 / P_Hg〜3高压表明,只有当As替代阳离子子晶格上的As_Hg和阴离子子晶格上的As_Te时,才能解释这些特征。由于空位机制引起的移动式As_Hg扩散,阳离子子晶格上发生扩散。 As二聚体或四聚体复合物的浓度很高,这取决于As浓度以及P_Hg的不正确变化而导致D(As)。另一个重要的结果是,对于至少在250℃以下的这些砷浓度,Hg_0.8Cd_0.2Te是电固有的。

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