首页> 外文期刊>Semiconductor science and technology >Electrical measurements of structural defects in Cd_(0.9)Zn_(0.1)Te by atomic force microscopy based methods
【24h】

Electrical measurements of structural defects in Cd_(0.9)Zn_(0.1)Te by atomic force microscopy based methods

机译:基于原子力显微镜的方法电测量Cd_(0.9)Zn_(0.1)Te中的结构缺陷

获取原文
获取原文并翻译 | 示例
           

摘要

Bridgman grown, single crystal Cd_(0.9)Zn_(0.1)Te samples of non-spectroscopy grade material were investigated with nano-scale resolution by AFM based surface potential difference, electric force microscopy and tunnelling current methods. The results, confirmed by SEM characterization, indicate the presence of large, electrically charged structural defects. The defects are thought to be extended faults, creating significant variations in the surface band bending on the polished and etched crystal surface, and conductive channels in the bulk.
机译:通过基于原子力显微镜的表面电势差,电势显微镜和隧穿电流法,以纳米级分辨率研究了Bridgman生长的非光谱级材料Cd_(0.9)Zn_(0.1)Te单晶样品。通过SEM表征证实的结果表明存在大的带电结构缺陷。缺陷被认为是延伸的缺陷,在抛光和蚀刻的晶体表面上的表面带弯曲以及主体中的导电通道上产生了很大的差异。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号