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Simple analytical valence band structure including warping and non-parabolicity to investigate hole transport in Si and Ge

机译:简单的分析价带结构,包括翘曲和非抛物线形,可研究Si和Ge中的空穴传输

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摘要

This work proposes an analytical modelling of non-parabolicity for the valence bands of Si and Ge. With this aim, we obtained piecewise functions that enabled analytical evaluation of the energy after a free flight under drift, avoiding iterative procedures. In addition, particular attention was devoted to solving the problem of discontinuities in the density of states in bulk semiconductors, a shortcoming that had emerged in earlier approaches. Using our analytical functions, we were able to evaluate the mean hole energies at equilibrium and compare them with previous studies based on the pseudopotential method, obtaining an excellent agreement. We also used our analytical expressions in a single-particle Monte Carlo simulator to obtain the drift velocity under an external electric field and ohmic mobilities in pure Si and Ge. These results were compared with the experimental data and showed satisfactory agreement in all cases.
机译:这项工作提出了硅和锗价带的非抛物线的分析模型。为此,我们获得了分段函数,该函数可以对漂移下的自由飞行后的能量进行分析评估,从而避免了迭代过程。另外,特别关注于解决体半导体中状态密度的不连续性的问题,这是较早方法中出现的缺点。使用我们的解析函数,我们能够评估平衡时的平均空穴能,并将其与基于伪势方法的先前研究进行比较,从而获得了极好的协议。我们还使用单粒子蒙特卡罗模拟器中的解析表达式来获得在纯硅和锗中外部电场和欧姆迁移率下的漂移速度。将这些结果与实验数据进行比较,并在所有情况下均显示出令人满意的一致性。

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