首页> 外文期刊>Semiconductor science and technology >Enhanced Carrier Injection In Schottky Contacts Using Dopant Segregation: A Monte Carlo Research
【24h】

Enhanced Carrier Injection In Schottky Contacts Using Dopant Segregation: A Monte Carlo Research

机译:使用掺杂剂隔离的肖特基接触中增强的载流子注入:蒙特卡洛研究

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper we present a Monte Carlo research of the impact, on carrier transport, of including a dopant-segregated layer adjacent to the Schottky contact in back-to-back diodes. A comparison with a homogeneous structure is developed, evidencing that the doped layer boosts the tunneling current through the Schottky barrier, thus significantly improving the injection of carriers at the contact. We have carried out a complete study of carrier injection and transport in the region close to the reverse-biased contact together with the analysis of internal quantities such as conduction band, carrier density and electric field. The effect of temperature on the current is also evaluated. The study of the velocity distribution functions and the average number of scatterings undergone by the carriers reveals that devices with dopant segregation exhibit an enhancement of the ballistic transport in the first nanometers close to the Schottky contact.
机译:在本文中,我们提出了蒙特卡罗研究,研究了背靠背二极管中包括与肖特基接触相邻的掺杂剂隔离层对载流子传输的影响。与均质结构进行了比较,证明掺杂层可提高通过肖特基势垒的隧穿电流,从而显着改善了接触处载流子的注入。我们已经对反向偏置接触附近区域的载流子注入和输运进行了完整的研究,并分析了内部量,例如导带,载流子密度和电场。还评估了温度对电流的影响。对速度分布函数和载体所经历的平均散射数量的研究表明,具有掺杂剂偏析的器件在靠近肖特基接触的第一个纳米中表现出弹道传输的增强。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号