Comparison of composition and atomic structure of amorphous indium gallium zinc oxide thin film transistor before and after positive bias temperature stress by transmission electron microscopy

摘要

In this paper high resolution transmission electron microscopy analysis is performed on indium gallium zinc oxide thin film transistors to determine the crystal structure of the material. The relative elemental concentrations of indium, gallium, zinc and oxygen were quantified and analyzed using energy dispersive spectroscopy before and after subjection to positive gate bias temperature stress at 80 degrees C. Notable changes in the concentration of oxygen in the device channel were observed along with a reduced concentration of the elements indium, gallium and zinc after electrical stressing. We speculate this relative reduction in metal concentration could be attributed to the outdiffusion of metal ions from the channel region into the surrounding thermal oxide and the increase in the oxygen concentration in the stressed device is related to electric field assisted adsorption of oxygen from the ambient.