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Short cavity InGaN-based laser diodes with cavity length below 300μm

机译:腔长小于300μm的短腔InGaN基激光二极管

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摘要

We report on a practical method for developing InGaN-based edge emitting laser diodes of cavity length down to 45 mu m. Samples consisting of one uncoated cleaved facet and one etched facet coated with a high-reflectivity (HR) dielectric distributed Bragg reflector (DBR) exhibit lasing in the continuous wave (cw) regime for cavity lengths down to 250 mu m and lasing under pulsed injection for lengths as short as 100 mu m. For samples having a second HR dielectric DBR, we could demonstrate cw lasing for a cavity length as short as 45 mu m with a threshold current below 10 mA being reported for a 75 mu m long device. Through a systematic study of the threshold current (I-th) and the slope efficiency (eta(s)) as a function of cavity length, it is proposed that the parameters underpinning the evolution of I-th and eta(s) with decreasing cavity length and their overall degradation in the short cavity regime are free carrier absorption, Auger processes and the decrease in the recombination losses due to nonuniform carrier distribution across the multiple quantum well active region.
机译:我们报告了一种实用的方法,用于开发腔长度低至45μm的InGaN基边缘发射激光二极管。由一个未镀膜的切割面和一个被高反射率(HR)介电分布的布拉格反射器(DBR)覆盖的蚀刻面组成的样品在连续波(cw)方式下产生的激光腔长度小于250μm,并且在脉冲注入下产生激光长度短至100微米。对于具有第二个HR电介质DBR的样品,我们可以证明腔长度短至45μm的连续激光发射,据报道,对于75μm长的器件,阈值电流低于10 mA。通过系统研究阈值电流(I-th)和斜率效率(eta(s))与腔体长度的关系,提出了随着I-th和eta(s)的减小而演化的参数。空穴长度及其在短腔态下的整体降解是自由载流子吸收,俄歇过程以及由于跨多个量子阱活性区域的载流子分布不均匀而导致的重组损失的减少。

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