New Products

摘要

The Orion single-wafer cleaning system has a unique closed chamber design that permits complete control and containment of the wafer environment, addressing several cleaning-related issues for 32 and 22 nm technologies, including reduced material loss and galvanic corrosion in advanced processes. The system incorporates in-line chemical blending and control, energetic aerosol chemical and water delivery, and flexible, recipe-driven procedures. The tool's 3-D cluster configuration delivers high throughput, great flexibility and a reduced footprint.