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3-d Ics enter Commercialization

机译:3-d Ics进入商业化

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Part 1 of this article, "How Might 3-D ICs Come Together?", reviewed the various processing options for fabricating 3-D stacked devices. Part 2 examines the activities of companies commercializing 3-D through-silicon via (TSV) technology. Traditional device scaling will reach its physical limit within the next 10-15 years, leaving little time for the development of new device structures such as carbon nanotubes (CNTs), spintronics and molecular switches. Therefore, while the integration of copper and low-k dielectrics continues, mounting concerns on device and system levels have industry leaders looking for new assembly methods to fill a short-term need. At the forefront are 3-D ICs, which can shorten interconnect lengths and lead to improvements in latency, power consumption and memory bandwidth.
机译:本文的第1部分“如何将3-D IC集成在一起”,回顾了制造3-D堆叠器件的各种处理选项。第2部分介绍了公司通过TSV技术进行3D硅直通的商业活动。传统的器件缩放将在未来10到15年内达到其物理极限,从而几乎没有时间开发诸如碳纳米管(CNT),自旋电子学和分子开关等新器件结构。因此,尽管铜和低k电介质的集成仍在继续,但在设备和系统级别上越来越引起人们的关注,业界领导者正在寻找新的组装方法来满足短期需求。最前沿的是3-D IC,它可以缩短互连长度并改善等待时间,功耗和存储器带宽。

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